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Buvat, G., Iadecola, A., Blanchard, F., Brousse, T., Roussel, P. & Lethien, C. (2021) A First Outlook of Sputtered FeWO4 Thin Films for Micro-Supercapacitor Electrodes. J. Electrochem. Soc. 168 030524.
Added by: Richard Baschera (2021-04-09 11:39:09) Last edited by: Richard Baschera (2021-04-09 11:41:57) |
| Type de référence: Article DOI: 10.1149/1945-7111/abec57 Numéro d'identification (ISBN etc.): 1945-7111 Clé BibTeX: Buvat2021 Voir tous les détails bibliographiques  |
Catégories: ST2E Créateurs: Blanchard, Brousse, Buvat, Iadecola, Lethien, Roussel Collection: J. Electrochem. Soc. |
Consultations : 1/473
Indice de consultation : 8% Indice de popularité : 2% |
| Liens URLs https://doi.org/10.1149/1945-7111/abec57 |
| Résumé |
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The next generation of Internet of Things devices requires micro-supercapacitors operating at high voltage which is difficult to achieve using symmetrical design. Thus, their fabrication in an asymmetric configuration is mandatory. While MnO2 is well-established as positive electrode, the scarcity of existing efficient materials able to be used at the negative side drives the research towards new promising materials. Since few years, a new class of oxide materials, named multicationic oxides, were demonstrated to be attractive solutions as bulk electrodes for electrochemical capacitor. Among them, the wolframite-type FeWO4 oxide was proposed as an interesting negative electrode material for asymmetric FeWO4/MnO2 electrochemical capacitors. The present paper reports for the first time on the successful thin film synthesis of such iron-tungstate oxide films by reactive DC magnetron sputtering, a deposition method widely used in the semiconductor industry to manufacture micro-devices. The pseudocapacitive behaviour documented at the bulk scale is preserved at the thin film level as well, and opens-up the possibility to use FeWO4 in the next generations of micro-supercapacitors.
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| Notes |
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Publisher: The Electrochemical Society
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