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Achour, A., Aissa, A. K., Mbarek, M., El Hadj, K., Ouldhamadouche, N., Barreau, N., Le Brizoual, L. & Djouadi, M. A. (2013) Enhancement of near-band edge photoluminescence of ZnO film buffered with TiN. Thin Solid Films, 538 71–77. 
Added by: Laurent Cournède (2016-03-10 21:23:30)
Type de référence: Article
DOI: 10.1016/j.tsf.2012.11.117
Numéro d'identification (ISBN etc.): 0040-6090
Clé BibTeX: Achour2013
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Mots-clés: buffer layer, epitaxial-growth, layer, optical-properties, photoluminescence, preferred orientation, raman, RF-sputtering, substrate, temperature, thin-films, tin, XPS, zinc-oxide, ZnO film
Créateurs: Achour, Aissa, Barreau, Djouadi, El Hadj, Le Brizoual, Mbarek, Ouldhamadouche
Collection: Thin Solid Films
Consultations : 1/997
Indice de consultation : 7%
Indice de popularité : 1.75%
ZnO films were deposited on Si substrate by RF-sputtering using titanium nitride (TiN) as buffer layer that was deposited at different thicknesses: 160 and 2290 nm. Despite the lattice mismatch of up to 6.35\% between ZnO and TiN, the ZnO films deposited on TiN buffer layers show enhanced near-band-edge photoluminescence (PL) emission at room temperature which is two times higher of magnitude than those grown directly on Si. The PL enhancement intensity, provided by TiN buffer introduction, is attributed to the improvement of ZnO crystalline quality and stoichiometry. The use of a good electrical conductor which has high thermal stability like TiN as buffer layer for the blue emission enhancement of ZnO would make it promising for optoelectronic applications. (c) 2012 Elsevier B.V. All rights reserved.
Added by: Laurent Cournède  
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