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Jacq, S., Cardinaud, C., Le Brizoual, L. & Granier, A. (2013) H atom surface loss kinetics in pulsed inductively coupled plasmas. Plasma Sources Sci. Technol. 22 055004. 
Added by: Laurent Cournède (2016-03-10 21:23:29)
Type de référence: Article
DOI: 10.1088/0963-0252/22/5/055004
Numéro d'identification (ISBN etc.): 0963-0252
Clé BibTeX: Jacq2013
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Catégories: PCM
Mots-clés: density, diamond, discharges, gas, hydrogen plasmas, induced fluorescence, probe, recombination
Créateurs: Cardinaud, Granier, Jacq, Le Brizoual
Collection: Plasma Sources Sci. Technol.
Consultations : 7/494
Indice de consultation : 3%
Indice de popularité : 0.75%
Pulsed plasmas are very powerful tools to investigate mechanisms. This paper is focused on H atom kinetics in low-pressure high-density inductively coupled pulsed plasmas. We explore pure H-2, H-2/N-2, CH4/H-2 and CH4/N-2 mixtures. These gas mixtures offer two very different kinds of wall conditions, which are stainless-steel and hydrocarbon-coated walls. It shows that H loss probability (beta) is sensitive to wall conditions. Efforts are made to understand beta evolutions with the different parameters. The effect of pressure in non-depositing plasmas is also investigated. Evolution of H atom surface loss probability is linked to ion flux measurements. Ion bombardment promotes H surface loss.
Added by: Laurent Cournède  
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