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Dain, G. L., Laourine, F., Guilet, S., Czerwiec, T., Marcos, G., Noel, C., Henrion, G., Cardinaud, C., Girard, A. & Rhallabi, A. (2021) Etching of iron and iron-chromium alloys using ICP-RIE chlorine plasma. Plasma Sources Science and Technology, 30 095022. 
Added by: Richard Baschera (2021-10-14 13:09:08)   Last edited by: Richard Baschera (2021-10-25 15:13:56)
Type de référence: Article
DOI: 10.1088/1361-6595/ac1714
Numéro d'identification (ISBN etc.): 0963-0252
Clé BibTeX: Dain2021
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Catégories: PCM
Créateurs: Cardinaud, Czerwiec, Dain, Girard, Guilet, Henrion, Laourine, Marcos, Noel, Rhallabi
Collection: Plasma Sources Science and Technology
Consultations : 2/270
Indice de consultation : 8%
Indice de popularité : 2%
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The dry etching process of Fe, Cr and Fe–Cr alloys under a chlorine-based plasma is studied. The objective is to create new surface functionalities. The approach combines an experimental study of an ICP (Inductively Coupled Plasma) reactor with the development of a multi-scale etching model including kinetic, sheath and surface models. The results from plasma etching of substrates made of Fe, Cr and Fe–Cr alloys are presented. Optical emission spectroscopy and interferometry measurements show strong modifications of the plasma when Fe or Cr samples are present in the reactor. It is shown that Fe is easier to etch than Cr. The study highlights the role of chemical etching by the formation of volatile products such as FeCl3. The Cr content in Fe–Cr alloys has a strong impact on both the lateral and vertical etch rates, as well as on the roughness along the profile. For Fe-Cr alloys, the experimental and calculated values of etch rate are very similar. The concept of hard zones is introduced to get a better agreement between simulation results and experimental ones. This good agreement demonstrates the capability of the developed simulator to implement new phenomena.
Publisher: IOP Publishing
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