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Li, D., Bulou, S., Gautier, N., Elisabeth, S., Goullet, A., Richard-Plouet, M., Choquet, P. & Granier, A. (2019) Nanostructure and photocatalytic properties of TiO2 films deposited at low temperature by pulsed PECVD. Applied Surface Science, 466 63–69. 
Added by: Richard Baschera (2019-01-04 10:38:22)   Last edited by: Richard Baschera (2019-01-04 10:39:30)
Type de référence: Article
DOI: 10.1016/j.apsusc.2018.09.230
Clé BibTeX: Li2019
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Créateurs: Bulou, Choquet, Elisabeth, Gautier, Goullet, Granier, Li, Richard-Plouet
Collection: Applied Surface Science
Consultations : 1/417
Indice de consultation : 4%
Indice de popularité : 1%
The nanostructure and photocatalytic properties of TiO2 thin films deposited by PECVD on silicon substrates were investigated. The films were grown at low temperature ({<} 120 degrees C) in an rf inductively coupled oxygen/titanium tetraisopropoxide plasma, in continuous and pulsed modes with different plasma-on time (via variation of the duty cycle, DC). All the films exhibit nano-columnar structures, but the reduction of plasma-on time by decreasing the duty cycle for pulsed mode leads to a more homogenous morphology with a diminished column size, and a decrease in the surface roughness. TiO2 layers containing a high amount of anatase were grown at substrate temperatures less than 100 degrees C corresponding to DC {>}= 40%, then the crystallization was hindered with the decrease of DC, even inducing amorphous films for DC {<}= 10%. Moreover, the films deposited below 100 degrees C with deposition conditions where 50% {<}= DC {<}= 75% were shown to present a high photocatalytic activity, likely due to the presence of anatase crystalline nanocolumns at the surface.
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