Biblio. IMN

Référence en vue solo

Avella, M., Jimenez, J., Pommereau, F., Landesman, J. P. & Rhallabi, A. (2007) Investigation of point defect generation in dry etched InP ridge waveguide structures. Appl. Phys. Lett. 90 223510. 
Added by: Laurent Cournède (2016-03-10 22:02:30)
Type de référence: Article
DOI: 10.1063/1.2743384
Numéro d'identification (ISBN etc.): 0003-6951
Clé BibTeX: Avella2007
Voir tous les détails bibliographiques
Catégories: PCM
Mots-clés: damage, layers, photoluminescence, quantum-well
Créateurs: Avella, Jimenez, Landesman, Pommereau, Rhallabi
Collection: Appl. Phys. Lett.
Consultations : 2/480
Indice de consultation : 3%
Indice de popularité : 0.75%
Waveguides engraved in InP by dry etching, reactive ion etching and inductively coupled plasma (ICP), were studied by cathodoluminescence. The dry etching processes were found to induce nonradiative recombination centers, which reduce the luminescence emission from the ridge structures. In addition, the ICP process introduced intrinsic defects, probably In vacancy related defects, which were generated at the dielectric cap/InP interface at the ridge top. (C) 2007 American Institute of Physics.
Added by: Laurent Cournède  
wikindx 4.2.2 ©2014 | Références totales : 2699 | Requêtes métadonnées : 55 | Exécution de script : 0.11565 secs | Style : Harvard | Bibliographie : Bibliographie WIKINDX globale