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Dubosc, M., Casimirius, S., Besland, M. .-P., Cardinaud, C., Granier, A., Duvail, J. .-L., Gohier, A., Minea, T., Arnal, V. & Torres, J. (2007) Impact of the Cu-based substrates and catalyst deposition techniques on carbon nanotube growth at low temperature by PECVD. Microelectron. Eng. 84 2501–2505.
Added by: Laurent Cournède (2016-03-10 22:02:29) |
| Type de référence: Article DOI: 10.1016/j.mee.2007.05.024 Numéro d'identification (ISBN etc.): 0167-9317 Clé BibTeX: Dubosc2007 Voir tous les détails bibliographiques  |
Catégories: PCM, PMN Mots-clés: carbon nanotubes (CNT), chemical-vapor-deposition, electrochemical deposition (ECD), mechanism, nanofibers, plasma enhanced chemical vapor deposition (PECVD) Créateurs: Arnal, Besland, Cardinaud, Casimirius, Dubosc, Duvail, Gohier, Granier, Minea, Torres Collection: Microelectron. Eng. |
Consultations : 1/486
Indice de consultation : 3% Indice de popularité : 0.75% |
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This article reports on carbon nanotubes (CNT) grown on TiN/Cu stacks by plasma enhanced chemical vapor deposition (PECVD) at 450 degrees C. Ni catalyst was deposited by two techniques - physical vapor deposition (PVD) and electrochemical deposition (ECD). First, the influence of the catalyst thickness and the catalyst deposition technique on grown CNTs is investigated. Second, the enhancement of the CNTs growth by use of electrodeposited catalysts is emphasized. (C) 2007 Published by Elsevier B.V.
Added by: Laurent Cournède |