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Begou, T., Beche, B., Landesman, J. P., Gaviot, E., Soussou, A., Makaoui, K., Besland, M. P., Granier, A. & Goullet, A. (2008) Integrated optics based on plasma processed dielectric materials. Kruschwitz, J. D. T. & Ellison, M. J. (Eds.), Advances in Thin-Film Coatings for Optical Applications V Bellingham. 
Added by: Laurent Cournède (2016-03-10 21:58:42)
Type de référence: Chapitre/Section
Numéro d'identification (ISBN etc.): 978-0-8194-7287-8
Clé BibTeX: Begou2008a
Voir tous les détails bibliographiques
Catégories: PCM
Mots-clés: coatings, deposition, Ellipsometry, ftir, helicon reactor, hmdso, integrated optics, organosilicon films, pecvd, Plasma process and deposition, plasma-polymer-HMDSO, polymer, spectroscopic ellipsometry, tio2 thin-films, titanium oxide, wave-guides, waveguides
Créateurs: Beche, Begou, Besland, Ellison, Gaviot, Goullet, Granier, Kruschwitz, Landesman, Makaoui, Soussou
Éditeur: Spie-Int Soc Optical Engineering (Bellingham)
Collection: Advances in {Thin}-{Film} {Coatings} for {Optical} {Applications} {V}
Consultations : 4/865
Indice de consultation : 5%
Indice de popularité : 1.25%
A first generation of dielectric rib waveguides has been designed and shaped to support a monomode confinement by using organosilicon materials elaborated by plasma enhanced chemical vapor deposition (PECVD). Optical losses have been measured around and for TE00 and TM00 modes, respectively. Then, synthesis of titanium dioxide thin films by PECVD has been investigated to improve optical and propagation properties. The first results on these films exhibit a refractive index around 1.99 at a 633 nm wavelength with a 380 nm optical gap. When an rf bias is applied to the substrate, the refractive index reaches 2.36, from -5V, without significant optical gap variation.
Added by: Laurent Cournède  
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