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Bousquet, A., Granier, A., Cartry, G. & Goullet, A. (2008) Kinetics of O and H atoms in pulsed O(2)/HMDSO low pressure PECVD plasmas. J. Optoelectron. Adv. Mater. 10 1999–2002. 
Added by: Laurent Cournède (2016-03-10 21:58:41)
Type de référence: Article
Numéro d'identification (ISBN etc.): 1454-4164
Clé BibTeX: Bousquet2008
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Catégories: PCM
Mots-clés: deposition, hmdso, induced fluorescence, o-2, O-atom kinetics, optical-emission spectroscopy, Oxygen, pecvd, pulsed plasma, time-resolved emission
Créateurs: Bousquet, Cartry, Goullet, Granier
Collection: J. Optoelectron. Adv. Mater.
Consultations : 6/440
Indice de consultation : 2%
Indice de popularité : 0.5%
Résumé     
The 0 and H atom kinetics in a low pressure inductively coupled radiofrequency O(2)/Hexamethyldisiloxane and water vapour pulsed plasma is investigated by Time-Resolved Optical Emission Spectroscopy. The O and H-atom loss coefficients in the post-discharge of O(2)/HMDSO pulsed plasmas were measured to be 210(-3) and 3.10(-4) respectively. Such low recombination coefficients, as compared to the ones measured in oxygen plasmas (approximate to 10(-2)), are attributed to the adsorption of OH and H(2)O at the reactor walls which limits the O and H atom recombination. O and H atoms are likely to be responsible for HMDSO dissociation and subsequent film deposition during the post-discharge.
Added by: Laurent Cournède  
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