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| Bulou, S., Le Brizoual, L., Miska, P., de Poucques, L., Hugon, R., Belmahi, M. & Bougdira, J. (2011) The influence of CH4 addition on composition, structure and optical characteristics of SiCN thin films deposited in a CH4/N-2/Ar/hexamethyldisilazane microwave plasma. Thin Solid Films, 520 245–250. |
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| Added by: Laurent Cournède 2016-03-10 21:32:19 |
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| Bulou, S., Le Brizoual, L., Miska, P., de Poucques, L., Hugon, R., Belmahi, M. & Bougdira, J. (2011) Structural and optical properties of a-SiCN thin film synthesised in a microwave plasma at constant temperature and different flow of CH4 added to HMDSN/N-2/Ar mixture. Surf. Coat. Technol. 205 S214–S217. |
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| Added by: Laurent Cournède 2016-03-10 21:32:20 |
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| Li, D., Carette, M., Granier, A., Landesman, J. P. & Goullet, A. (2012) Spectroscopic ellipsometry analysis of TiO2 films deposited by plasma enhanced chemical vapor deposition in oxygen/titanium tetraisopropoxide plasma. Thin Solid Films, 522 366–371. |
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| Added by: Laurent Cournède 2016-03-10 21:28:38 |
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| Li, D., Elisabeth, S., Granier, A., Carette, M., Goullet, A. & Landesman, J.-P. (2016) Structural and Optical Properties of PECVD TiO2-SiO2 Mixed Oxide Films for Optical Applications. Plasma Process. Polym. 13 918–928. |
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| Last edited by: Richard Baschera 2016-12-14 15:59:44 |
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| Li, D., Carette, M., Granier, A., Landesman, J. P. & Goullet, A. (2013) In situ spectroscopic ellipsometry study of TiO2 films deposited by plasma enhanced chemical vapour deposition. Appl. Surf. Sci. 283 234–239. |
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| Added by: Laurent Cournède 2016-03-10 21:23:29 |
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| Li, D., Dai, S., Goullet, A. & Granier, A. (2018) The Effect of Plasma Gas Composition on the Nanostructures and Optical Properties of TiO2 Films Prepared by Helicon-PECVD. Nano, 13 1850124. |
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| Last edited by: Richard Baschera 2018-12-20 08:33:31 |
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| Li, D., Goullet, A., Carette, M., Granier, A., Zhang, Y. & Landesman, J. P. (2016) Structural and optical properties of RF-biased PECVD TiO2 thin films deposited in an O-2/TTIP helicon reactor. Vacuum, 131 231–239. |
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| Last edited by: Richard Baschera 2016-10-07 09:06:54 |
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| Li, D., Goullet, A., Carette, M., Granier, A. & Landesman, J. P. (2016) Effect of growth interruptions on TiO2 films deposited by plasma enhanced chemical vapour deposition. Mater. Chem. Phys. 182 409–417. |
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| Last edited by: Richard Baschera 2016-10-18 09:43:35 |
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| Sarakha, L., Begou, T., Goullet, A., Cellier, J., Bousquet, A., Tomasella, E., Sauvage, T., Boutinaud, P. & Mahiou, R. (2011) Influence of synthesis conditions on optical and electrical properties of CaTiO3:Pr3+ thin films deposited by radiofrequency sputtering for electroluminescent device. Surf. Coat. Technol. 205 S250–S253. |
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| Added by: Laurent Cournède 2016-03-10 21:32:20 |
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| Stolz, A., Soltani, A., Abdallah, B., Charrier, J., Deresmes, D., Jouan, P. .-Y., Djouadi, M. A., Dogheche, E. & De Jaeger, J. .-C. (2013) Optical properties of aluminum nitride thin films grown by direct-current magnetron sputtering close to epitaxy. Thin Solid Films, 534 442–445. |
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| Added by: Laurent Cournède 2016-03-10 21:23:31 |
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