IMN

Biblio. IMN

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Bigot, S., Louarn, G., Kebir, N. & Burel, F. (2014) Straightforward approach to graft bioactive polysaccharides onto polyurethane surfaces using an ionic liquid. Appl. Surf. Sci. 314 301–307.   
Added by: Laurent Cournède 2016-03-10 21:01:55 Pop. 1%
Bittencourt, C., Navio, C., Nicolay, A., Ruelle, B., Godfroid, T., Snyders, R., Colomer, J. .-F., Lagos, M. J., Ke, X., Van Tendeloo, G., Suarez-Martinez, I. & Ewels, C. P. (2011) Atomic Oxygen Functionalization of Vertically Aligned Carbon Nanotubes. J. Phys. Chem. C, 115 20412–20418.   
Added by: Laurent Cournède 2016-03-10 21:32:19 Pop. 1%
Bittencourt, C., Ke, X., Van Tendeloo, G., Thiess, S., Drube, W., Ghijsen, J. & Ewels, C. P. (2012) Study of the interaction between copper and carbon nanotubes. Chem. Phys. Lett. 535 80–83.   
Added by: Laurent Cournède 2016-03-10 21:28:39 Pop. 1%
Bouchet-Fabre, B., Fernandez, V., Gohier, A., Parent, P., Laffon, C., Angleraud, B., Tessier, P. Y. & Minea, T. M. (2009) Temperature effect on the nitrogen insertion in carbon nitride films deposited by ECR. Diam. Relat. Mat. 18 1091–1097.   
Added by: Laurent Cournède 2016-03-10 21:41:23 Pop. 1.75%
Bouts, N., Gaillard, M., Donero, L., El Mel, A. A., Gautron, E., Angleraud, B., Boulmer-Leborgne, C. & Tessier, P. Y. (2017) Growth control of carbon nanotubes using nanocomposite nickel/carbon thin films. Thin Solid Films, 630 38–47.   
Last edited by: Richard Baschera 2020-01-22 16:01:15 Pop. 1.25%
Bulusheva, L. G., Fedoseeva, Y. V., Okotrub, A. V., Flahaut, E., Asanov, I. P., Koroteev, V. O., Yaya, A., Ewels, C. P., Chuvilin, A. L., Felten, A., Van Lier, G. & Vyalikh, D. V. (2010) Stability of Fluorinated Double-Walled Carbon Nanotubes Produced by Different Fluorination Techniques. Chem. Mat. 22 4197–4203.   
Added by: Laurent Cournède 2016-03-10 21:37:32 Pop. 1%
Chanson, R., Rhallabi, A., Fernandez, M. C. & Cardinaud, C. (2013) Modeling of InP Etching Under ICP Cl2/Ar/N2 Plasma Mixture: Effect of N2 on the Etch Anisotropy Evolution. Plasma Process. Polym. 10 213–224.   
Added by: Laurent Cournède 2016-03-10 21:23:31 Pop. 1%
Chanson, R., Rhallabi, A., Fernandez, M. C., Cardinaud, C., Bouchoule, S., Gatilova, L. & Talneau, A. (2012) Global Model of Cl-2/Ar High-Density Plasma Discharge and 2-D Monte-Carlo Etching Model of InP. IEEE Trans. Plasma Sci. 40 959–971.   
Added by: Laurent Cournède 2016-03-10 21:28:39 Pop. 1%
Errien, N., Vellutini, L., Louarn, G. & Froyer, G. (2007) Surface characterization of porous silicon after pore opening processes, inducing chemical modifications. Appl. Surf. Sci. 253 7265–7271.   
Added by: Laurent Cournède 2016-03-10 22:02:30 Pop. 1.75%
Ferrec, A., Keraudy, J. & Jouan, P.-Y. (2016) Mass spectrometry analyzes to highlight differences between short and long HiPIMS discharges. Appl. Surf. Sci. 390 497–505.   
Last edited by: Richard Baschera 2016-12-02 14:51:51 Pop. 1.25%
Haidar, Y., Pateau, A., Rhallabi, A., Fernandez, M. C., Mokrani, A., Taher, F., Roqueta, F. & Boufnichel, M. (2014) SF6 and C4F8 global kinetic models coupled to sheath models. Plasma Sources Sci. Technol. 23 065037.   
Added by: Laurent Cournède 2016-03-10 21:01:54 Pop. 1.25%
Jouan, P.-Y., Le Brizoual, L., Ganciu, M., Cardinaud, C., Tricot, S. & Djouadi, M.-A. (2010) HiPIMS Ion Energy Distribution Measurements in Reactive Mode. IEEE Trans. Plasma Sci. 38 3089–3094.   
Added by: Laurent Cournède 2016-03-10 21:37:31 Pop. 1.75%
Li, D., Goullet, A., Carette, M., Granier, A., Zhang, Y. & Landesman, J. P. (2016) Structural and optical properties of RF-biased PECVD TiO2 thin films deposited in an O-2/TTIP helicon reactor. Vacuum, 131 231–239.   
Last edited by: Richard Baschera 2016-10-07 09:06:54 Pop. 1%
Li, D., Elisabeth, S., Granier, A., Carette, M., Goullet, A. & Landesman, J.-P. (2016) Structural and Optical Properties of PECVD TiO2-SiO2 Mixed Oxide Films for Optical Applications. Plasma Process. Polym. 13 918–928.   
Last edited by: Richard Baschera 2016-12-14 15:59:44 Pop. 1.5%
Liu, B., Landesman, J. .-P., Leclercq, J. .-L., Rhallabi, A., Cardinaud, C., Guilet, S., Pommereau, F., Avella, M., Gonzalez, M. A. & Jimenez, J. (2006) InP surface properties under ICP plasma etching using mixtures of chlorides and hydrides. Mater. Sci. Semicond. Process, 9 225–229.   
Added by: Florent Boucher 2016-05-12 13:21:38 Pop. 1%
Marcos, G., Rhallabi, A. & Ranson, P. (2008) Properties of deep etched trenches in silicon: Role of the angular dependence of the sputtering yield and the etched species redeposition. Appl. Surf. Sci. 254 3576–3584.   
Added by: Laurent Cournède 2016-03-10 21:58:42 Pop. 1%
Pereira, J., Pichon, L. E., Dussart, R., Cardinaud, C., Duluard, C. Y., Oubensaid, E. H., Lefaucheux, P., Boufnichel, M. & Ranson, P. (2009) In situ x-ray photoelectron spectroscopy analysis of SiOxFy passivation layer obtained in a SF6/O-2 cryoetching process. Appl. Phys. Lett. 94 071501.   
Added by: Laurent Cournède 2016-03-10 21:41:24 Pop. 1%
Point, S., Minea, T., Besland, M. P. & Granier, A. (2006) Characterization of carbon nanotubes and carbon nitride nanofibres synthesized by PECVD. Eur. Phys. J.-Appl. Phys, 34 157–163.   
Added by: Florent Boucher 2016-05-12 13:21:37 Pop. 0.75%
Suarez-Martinez, I., Ewels, C. P., Ke, X., Van Tendeloo, G., Thiess, S., Drube, W., Felten, A., Pireaux, J.-J., Ghijsen, J. & Bittencourt, C. (2010) Study of the Interface between Rhodium and Carbon Nanotubes. ACS Nano, 4 1680–1686.   
Added by: Laurent Cournède 2016-03-10 21:37:33 Pop. 1%
Tailleur, A., Achour, A., Djouadi, M. A., Le Brizoual, L., Gautron, E. & Tristant, P. (2012) PECVD low temperature synthesis of carbon nanotubes coated with aluminum nitride. Surf. Coat. Technol. 211 18–23.   
Added by: Laurent Cournède 2016-03-10 21:28:38 Pop. 1%
Zhang, W., Bonnet, P., Dubois, M., Ewels, C. P., Guerin, K., Petit, E., Mevellec, J.-Y., Vidal, L., Ivanov, D. A. & Hamwi, A. (2012) Comparative Study of SWCNT Fluorination by Atomic and Molecular Fluorine. Chem. Mat. 24 1744–1751.   
Added by: Laurent Cournède 2016-03-10 21:28:39 Pop. 1%
wikindx 4.2.2 ©2014 | Références totales : 2859 | Requêtes métadonnées : 110 | Exécution de script : 0.12102 secs | Style : Harvard | Bibliographie : Bibliographie WIKINDX globale