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| Added by: Laurent Cournède 2016-03-10 21:23:31 |
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| Chanson, R., Rhallabi, A., Fernandez, M. C., Cardinaud, C., Bouchoule, S., Gatilova, L. & Talneau, A. (2012) Global Model of Cl-2/Ar High-Density Plasma Discharge and 2-D Monte-Carlo Etching Model of InP. IEEE Trans. Plasma Sci. 40 959–971. |
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| Added by: Laurent Cournède 2016-03-10 21:28:39 |
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| Donero, L., Bouts, N., El Mel, A. A., Le Borgne, B., Gautron, E., Le Brizoual, L., Le Bihan, F. & Tessier, P. Y. (2017) Effect of temperature on the synthesis of nanoporous carbon from copper/carbon thin films to nanoporous carbon for sensing applications. Thin Solid Films, 630 59–65. |
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| Last edited by: Richard Baschera 2018-03-28 15:16:10 |
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| Haidar, Y., Pateau, A., Rhallabi, A., Fernandez, M. C., Mokrani, A., Taher, F., Roqueta, F. & Boufnichel, M. (2014) SF6 and C4F8 global kinetic models coupled to sheath models. Plasma Sources Sci. Technol. 23 065037. |
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| Added by: Laurent Cournède 2016-03-10 21:01:54 |
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| Liu, B., Landesman, J. .-P., Leclercq, J. .-L., Rhallabi, A., Cardinaud, C., Guilet, S., Pommereau, F., Avella, M., Gonzalez, M. A. & Jimenez, J. (2006) InP surface properties under ICP plasma etching using mixtures of chlorides and hydrides. Mater. Sci. Semicond. Process, 9 225–229. |
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| Added by: Florent Boucher 2016-05-12 13:21:38 |
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| Marcos, G., Rhallabi, A. & Ranson, P. (2008) Properties of deep etched trenches in silicon: Role of the angular dependence of the sputtering yield and the etched species redeposition. Appl. Surf. Sci. 254 3576–3584. |
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| Added by: Laurent Cournède 2016-03-10 21:58:42 |
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| Meyer, T., Girard, A., LeDain, G., Rhallabi, A., Baudet, E., Nazabal, V., Nemec, P. & Cardinaud, C. (2021) Surface composition and micromasking effect during the etching of amorphous Ge-Sb-Se thin films in SF6 and SF6 /Ar plasmas. Applied Surface Science, 549 149192. |
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| Last edited by: Richard Baschera 2021-04-09 11:41:07 |
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