| Bailly, F., David, T., Chevolleau, T., Darnon, M., Posseme, N., Bouyssou, R., Ducote, J., Joubert, O. & Cardinaud, C. (2010) Roughening of porous SiCOH materials in fluorocarbon plasmas. J. Appl. Phys. 108 014906. |
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| Added by: Laurent Cournède 2016-03-10 21:37:32 |
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| Bouchet-Fabre, B., Fernandez, V., Gohier, A., Parent, P., Laffon, C., Angleraud, B., Tessier, P. Y. & Minea, T. M. (2009) Temperature effect on the nitrogen insertion in carbon nitride films deposited by ECR. Diam. Relat. Mat. 18 1091–1097. |
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| Added by: Laurent Cournède 2016-03-10 21:41:23 |
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| Boulard, F., Baylet, J. & Cardinaud, C. (2010) Influence of Cadmium Composition on CH4-H-2-Based Inductively Coupled Plasma Etching of Hg1-x Cd (x) Te. J. Electron. Mater. 39 1256–1261. |
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| Added by: Laurent Cournède 2016-03-10 21:37:32 |
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| Boulard, F., Baylet, J. & Cardinaud, C. (2009) Effect of Ar and N-2 addition on CH4-H-2 based chemistry inductively coupled plasma etching of HgCdTe. J. Vac. Sci. Technol. A, 27 855–861. |
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| Added by: Laurent Cournède 2016-03-10 21:41:24 |
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| Bousquet, A., Cartry, G. & Granier, A. (2007) Investigation of O-atom kinetics in O-2, CO2, H2O and O-2/HMDSO low pressure radiofrequency pulsed plasmas by time-resolved optical emission spectroscopy. Plasma Sources Sci. Technol. 16 597–605. |
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| Added by: Laurent Cournède 2016-03-10 22:02:29 |
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| Buffiere, M., Brammertz, G., Sahayaraj, S., Batuk, M., Khelifi, S., Mangin, D., El Mel, A.-A., Arzel, L., Hadermann, J., Meuris, M. & Poortmans, J. (2015) KCN Chemical Etch for Interface Engineering in Cu2ZnSnSe4 Solar Cells. ACS Appl. Mater. Interfaces, 7 14690–14698. |
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| Added by: Laurent Cournède 2016-03-10 18:36:41 |
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| Chanson, R., Rhallabi, A., Fernandez, M. C., Cardinaud, C., Bouchoule, S., Gatilova, L. & Talneau, A. (2012) Global Model of Cl-2/Ar High-Density Plasma Discharge and 2-D Monte-Carlo Etching Model of InP. IEEE Trans. Plasma Sci. 40 959–971. |
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| Added by: Laurent Cournède 2016-03-10 21:28:39 |
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| Eon, D., Raballand, V., Cartry, G., Cardinaud, C., Vourdas, N., Argitis, P. & Gogolides, E. (2006) Plasma oxidation of polyhedral oligomeric silsesquioxane polymers. J. Vac. Sci. Technol. B, 24 2678–2688. |
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| Added by: Florent Boucher 2016-05-12 13:21:36 |
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| Keraudy, J., Molleja, G. J., Ferrec, A., Corraze, B., Richard-Plouet, M., Goullet, A. & Jouan, P. .-Y. (2015) Structural, morphological and electrical properties of nickel oxide thin films deposited by reactive sputtering. Appl. Surf. Sci. 357 838–844. |
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| Added by: Laurent Cournède 2016-03-10 18:36:40 |
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| Le Brizoual, L., Elmazria, O., Zghoon, S., Soussou, A., Sarry, F. & Djouadi, M. A. (2009) Isolated acoustic wave based on AlN/ZnO/diamond structure for sensor applications. 2009 Joint Meeting of the European Frequency and Time Forum and the Ieee International Frequency Control Symposium, Vols 1 and 2 New York. |
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| Added by: Laurent Cournède 2016-03-10 21:41:25 |
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| Le Brizoual, L., Elmazria, O., Zhgoon, S., Soussou, A., Sarry, F. & Djouadi, M. A. (2010) AlN/ZnO/Diamond Waveguiding Layer Acoustic Wave Structure: Theoretical and Experimental Results. IEEE Trans. Ultrason. Ferroelectr. Freq. Control, 57 1818–1824. |
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| Added by: Laurent Cournède 2016-03-10 21:37:32 |
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| Liu, B., Landesman, J. .-P., Leclercq, J. .-L., Rhallabi, A., Cardinaud, C., Guilet, S., Pommereau, F., Avella, M., Gonzalez, M. A. & Jimenez, J. (2006) InP surface properties under ICP plasma etching using mixtures of chlorides and hydrides. Mater. Sci. Semicond. Process, 9 225–229. |
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| Added by: Florent Boucher 2016-05-12 13:21:38 |
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| Raballand, V., Cartry, G. & Cardinaud, C. (2007) A model for Si, SiCH, SiO2, SiOCH, and porous SiOCH etch rate calculation in inductively coupled fluorocarbon plasma with a pulsed bias: Importance of the fluorocarbon layer. J. Appl. Phys. 102 063306. |
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| Added by: Laurent Cournède 2016-03-10 22:02:29 |
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| Rhallabi, A., Liu, B., Landesman, J. P. & Lecler, J. L. (2006) InP etching by chlorine ICP plasma for photonic crystal applications: Experiments and simulations New York, Ieee. |
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| Added by: Florent Boucher 2016-05-12 13:21:38 |
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