| Baudet, E., Cardinaud, C., Boidin, R., Girard, A., Gutwirth, J., Nemec, P. & Nazabal, V. (2018) X-ray photoelectron spectroscopy analysis of Ge-Sb-Se pulsed laser deposited thin films. Journal of the American Ceramic Society, 101 3347–3356. |
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| Last edited by: Richard Baschera 2018-07-24 13:54:54 |
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| Cemin, F., Girard, A. & Cardinaud, C. (2023) On the low temperature limits for cryogenic etching: A quasi in situ XPS study. Applied Surface Science, 637 157941. |
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| Last edited by: Richard Baschera 2023-08-24 08:51:17 |
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| Dain, G. L., Laourine, F., Guilet, S., Czerwiec, T., Marcos, G., Noel, C., Henrion, G., Cardinaud, C., Girard, A. & Rhallabi, A. (2021) Etching of iron and iron-chromium alloys using ICP-RIE chlorine plasma. Plasma Sources Science and Technology, 30 095022. |
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| Last edited by: Richard Baschera 2021-10-25 15:13:56 |
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| Ettouri, R., Tillocher, T., Lefaucheux, P., Boutaud, B., Fernandez, V., Fairley, N., Cardinaud, C., Girard, A. & Dussart, R. (2022) Combined analysis methods for investigating titanium and nickel surface contamination after plasma deep etching. Surface and Interface Analysis, 54 134. |
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| Last edited by: Richard Baschera 2022-06-16 09:27:17 |
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| Le Borgne, B., Girard, A., Cardinaud, C., Salaun, A.-C., Pichon, L. & Geneste, F. (2018) Covalent functionalization of polycrystalline silicon nanoribbons applied to Pb(II) electrical detection. Sensors and Actuators B-Chemical, 268 368–375. |
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| Last edited by: Richard Baschera 2018-07-24 13:00:00 |
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| Le Dain, G., Rhallabi, A., Girard, A., Cardinaud, C., Roqueta, F. & Boufnichel, M. (2019) Modeling of C4F8 inductively coupled plasmas: effects of high RF power on the plasma electrical properties. Plasma Sources Science & Technology, 28 085002. |
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| Last edited by: Richard Baschera 2019-08-23 13:36:25 |
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| Le Dain, G., Rhallabi, A., Cardinaud, C., Girard, A., Fernandez, M.-C., Boufnichel, M. & Roqueta, F. (2018) Modeling of silicon etching using Bosch process: Effects of oxygen addition on the plasma and surface properties. Journal of Vacuum Science & Technology A, 36 03E109. |
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| Last edited by: Richard Baschera 2018-07-24 12:58:27 |
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| Mazerie, I., Didier, P., Razan, F., Hapiot, P., Coulon, N., Girard, A., de Sagazan, O., Floner, D. & Geneste, F. (2018) A General Approach Based on Sampled-Current Voltammetry for Minimizing Electrode Fouling in Electroanalytical Detection. Chemelectrochem, 5 144–152. |
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Pop. 0.75%
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| Piet, J., Faider, W., Girard, A., Boulard, F. & Cardinaud, C. (2020) Investigation of organic precursors and plasma mixtures allowing control of carbon passivation when etching HgCdTe in hydrocarbon-based inductively coupled plasmas. Journal of Vacuum Science & Technology A, 38 053005. |
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| Last edited by: Richard Baschera 2020-11-17 13:38:54 |
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