IMN

Biblio. IMN

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Baudet, E., Cardinaud, C., Boidin, R., Girard, A., Gutwirth, J., Nemec, P. & Nazabal, V. (2018) X-ray photoelectron spectroscopy analysis of Ge-Sb-Se pulsed laser deposited thin films. Journal of the American Ceramic Society, 101 3347–3356.   
Last edited by: Richard Baschera 2018-07-24 13:54:54 Pop. 1%
Dain, G. L., Laourine, F., Guilet, S., Czerwiec, T., Marcos, G., Noel, C., Henrion, G., Cardinaud, C., Girard, A. & Rhallabi, A. (2021) Etching of iron and iron-chromium alloys using ICP-RIE chlorine plasma. Plasma Sources Science and Technology, 30 095022.   
Last edited by: Richard Baschera 2021-10-25 15:13:56 Pop. 1.75%
Ettouri, R., Tillocher, T., Lefaucheux, P., Boutaud, B., Fernandez, V., Fairley, N., Cardinaud, C., Girard, A. & Dussart, R. (2021) Combined analysis methods for investigating titanium and nickel surface contamination after plasma deep etching. Surface and Interface Analysis, n/a 110508.   
Last edited by: Richard Baschera 2021-11-18 10:01:45 Pop. 2.5%
Le Borgne, B., Girard, A., Cardinaud, C., Salaun, A.-C., Pichon, L. & Geneste, F. (2018) Covalent functionalization of polycrystalline silicon nanoribbons applied to Pb(II) electrical detection. Sensors and Actuators B-Chemical, 268 368–375.   
Last edited by: Richard Baschera 2018-07-24 13:00:00 Pop. 0.75%
Le Dain, G., Rhallabi, A., Girard, A., Cardinaud, C., Roqueta, F. & Boufnichel, M. (2019) Modeling of C4F8 inductively coupled plasmas: effects of high RF power on the plasma electrical properties. Plasma Sources Science & Technology, 28 085002.   
Last edited by: Richard Baschera 2019-08-23 13:36:25 Pop. 0.75%
Le Dain, G., Rhallabi, A., Cardinaud, C., Girard, A., Fernandez, M.-C., Boufnichel, M. & Roqueta, F. (2018) Modeling of silicon etching using Bosch process: Effects of oxygen addition on the plasma and surface properties. Journal of Vacuum Science & Technology A, 36 03E109.   
Last edited by: Richard Baschera 2018-07-24 12:58:27 Pop. 0.75%
Mazerie, I., Didier, P., Razan, F., Hapiot, P., Coulon, N., Girard, A., de Sagazan, O., Floner, D. & Geneste, F. (2018) A General Approach Based on Sampled-Current Voltammetry for Minimizing Electrode Fouling in Electroanalytical Detection. Chemelectrochem, 5 144–152.   
Last edited by: Richard Baschera 2018-02-08 09:35:28 Pop. 0.5%
Piet, J., Faider, W., Girard, A., Boulard, F. & Cardinaud, C. (2020) Investigation of organic precursors and plasma mixtures allowing control of carbon passivation when etching HgCdTe in hydrocarbon-based inductively coupled plasmas. Journal of Vacuum Science & Technology A, 38 053005.   
Last edited by: Richard Baschera 2020-11-17 13:38:54 Pop. 0.75%
wikindx 4.2.2 ©2014 | Références totales : 2592 | Requêtes métadonnées : 62 | Exécution de script : 0.20999 secs | Style : Harvard | Bibliographie : Bibliographie WIKINDX globale