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| Added by: Laurent Cournède 2016-03-10 21:58:41 |
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| Avella, M., Jimenez, J., Pommereau, F., Landesman, J. P. & Rhallabi, A. (2007) Investigation of point defect generation in dry etched InP ridge waveguide structures. Appl. Phys. Lett. 90 223510. |
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| Added by: Laurent Cournède 2016-03-10 22:02:30 |
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| Chanson, R., Martin, A., Avella, M., Jimenez, J., Pommereau, F., Landesman, J. P. & Rhallabi, A. (2010) Cathodoluminescence Study of InP Photonic Structures Fabricated by Dry Etching. J. Electron. Mater. 39 688–693. |
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| Added by: Laurent Cournède 2016-03-10 21:37:32 |
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| Elmonser, L., Rhallabi, A., Gaillard, M., Landesman, J. P., Talneau, A., Pommereau, F. & Bouadma, N. (2007) Modeling of the chemically assisted ion beam etching process: Application to the GaAs etching by Cl-2/Ar+. J. Vac. Sci. Technol. A, 25 126–133. |
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| Added by: Laurent Cournède 2016-03-10 22:02:31 |
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| Landesman, J. P., Levallois, C., Jimenez, J., Pommereau, F., Leger, Y., Beck, A., Delhaye, T., Torres, A., Frigeri, C. & Rhallabi, A. (2015) Evidence of chlorine ion penetration in InP/InAsP quantum well structures during dry etching processes and effects of induced-defects on the electronic and structural behaviour. Microelectron. Reliab. 55 1750–1753. |
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| Added by: Laurent Cournède 2016-03-10 18:36:41 |
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| Liu, B., Landesman, J. .-P., Leclercq, J. .-L., Rhallabi, A., Cardinaud, C., Guilet, S., Pommereau, F., Avella, M., Gonzalez, M. A. & Jimenez, J. (2006) InP surface properties under ICP plasma etching using mixtures of chlorides and hydrides. Mater. Sci. Semicond. Process, 9 225–229. |
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| Added by: Florent Boucher 2016-05-12 13:21:38 |
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| Liu, B., Landesman, J. .-P., Leclercq, J. .-L., Rhallabi, A., Avella, M., Gonzalez, M. A., Jimenez, J., Guilet, S., Cardinaud, C. & Pommereau, F. (2006) InP surface properties under ICP plasma etching using mixtures of chlorides and hydrides New York, Ieee. |
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| Added by: Florent Boucher 2016-05-12 13:21:38 |
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