IMN

Biblio. IMN

Liste de références

Affichage de 1 - 33 de 33 (Bibliographie: Bibliographie WIKINDX globale)
Paramètres :
Auteur:  Goullet
Ordonner par

Croissant
Décroissant
Utiliser tout ce qui est coché 
Utiliser tout ce qui est affiché 
Utiliser tous les items 
Al Alam, E., Cortes, I., Besland, M. .-P., Goullet, A., Lajaunie, L., Regreny, P., Cordier, Y., Brault, J., Cazarre, A., Isoird, K., Sarrabayrouse, G. & Morancho, F. (2011) Effect of surface preparation and interfacial layer on the quality of SiO2/GaN interfaces. J. Appl. Phys. 109 084511.   
Added by: Laurent Cournède 2016-03-10 21:32:21 Pop. 0.5%
Bachar, A., Bousquet, A., Mehdi, H., Monier, G., Robert-Goumet, C., Thomas, L., Belmahi, M., Goullet, A., Sauvage, T. & Tomasella, E. (2018) Composition and optical properties tunability of hydrogenated silicon carbonitride thin films deposited by reactive magnetron sputtering. Applied Surface Science, 444 293–302.   
Last edited by: Richard Baschera 2018-04-27 13:28:49 Pop. 0.5%
Beche, B., Pelletier, N., Gaviot, E., Hierle, R., Goullet, A., Landesman, J. P. & Zyss, J. (2006) Conception of optical integrated circuits on polymers. Microelectron. J. 37 421–427.   
Added by: Florent Boucher 2016-05-12 13:21:37 Pop. 0.25%
Begou, T., Beche, B., Goullet, A., Landesman, J. P., Granier, A., Cardinaud, C., Gaviot, E., Camberlein, L., Grossard, N., Jezequel, G. & Zyss, J. (2007) First developments for photonics integrated on plasma-polymer-HMDSO: Single-mode TE00-TM00 straight waveguides. Opt. Mater. 30 657–661.   
Added by: Laurent Cournède 2016-03-10 22:02:29 Pop. 0.5%
Begou, T., Beche, B., Landesman, J. P., Gaviot, E., Soussou, A., Makaoui, K., Besland, M. P., Granier, A. & Goullet, A. (2008) Integrated optics based on plasma processed dielectric materials. Kruschwitz, J. D. T. & Ellison, M. J. (Eds.), Advances in Thin-Film Coatings for Optical Applications V Bellingham.   
Added by: Laurent Cournède 2016-03-10 21:58:42 Pop. 0.5%
Begou, T., Beche, B., Grossard, N., Zyss, J., Goullet, A., Jezequel, G. & Gaviot, E. (2008) Marcatili's extended approach: comparison to semi-vectorial methods applied to pedestal waveguide design. J. Opt. A-Pure Appl. Opt. 10 055310.   
Added by: Laurent Cournède 2016-03-10 21:58:42 Pop. 0.5%
Begou, T., Becheb, B., Goullet, A., Granier, A., Cardinaud, C., Gaviot, E., Raballand, V., Landesman, J. P. & Zyss, J. (2006) Photonics integrated circuits on plasma-polymer-HMDSO: Single-mode TE(00)-TM(00) straight waveguides, S-bends, Y-junctions and mach-zehnder interferometers. Iecon 2006 - 32nd Annual Conference on Ieee Industrial Electronics, Vols 1-11 New York.   
Added by: Florent Boucher 2016-05-12 13:21:38 Pop. 0.5%
Bousquet, A., Bursikova, V., Goullet, A., Djouadi, A., Zajickova, L. & Granier, A. (2006) Comparison of structure and mechanical properties of SiO(2)-like films deposited in O(2)/HMDSO pulsed and continuous plasmas. Surf. Coat. Technol. 200 6517–6521.   
Added by: Florent Boucher 2016-05-12 13:21:37 Pop. 0.25%
Bousquet, A., Goullet, A., Leteinturier, C., Coulon, N. & Granier, A. (2008) Influence of ion bombardment on structural and electrical properties of SiO2 thin films deposited from O-2/HMDSO inductively coupled plasmas under continuous wave and pulsed modes. Eur. Phys. J.-Appl. Phys, 42 3–8.   
Added by: Laurent Cournède 2016-03-10 21:58:42 Pop. 0.25%
Bousquet, A., Granier, A., Goullet, A. & Landesman, J. P. (2006) Influence of plasma pulsing on the deposition kinetics and film structure in low pressure oxygen/hexamethyldisiloxane radiofrequency plasmas. Thin Solid Films, 514 45–51.   
Added by: Florent Boucher 2016-05-12 13:21:36 Pop. 0.25%
Bousquet, A., Granier, A., Cartry, G. & Goullet, A. (2008) Kinetics of O and H atoms in pulsed O(2)/HMDSO low pressure PECVD plasmas. J. Optoelectron. Adv. Mater. 10 1999–2002.   
Added by: Laurent Cournède 2016-03-10 21:58:41 Pop. 0.25%
Challali, F., Besland, M. P., Benzeggouta, D., Borderon, C., Hugon, M. C., Salimy, S., Saubat, J. C., Charpentier, A., Averty, D., Goullet, A. & Landesman, J. P. (2010) Investigation of BST thin films deposited by RF magnetron sputtering in pure Argon. Thin Solid Films, 518 4619–4622.   
Added by: Laurent Cournède 2016-03-10 21:37:32 Pop. 0.5%
Dey, B., Bulou, S., Gaulain, T., Ravisy, W., Richard-Plouet, M., Goullet, A., Granier, A. & Choquet, P. (2020) Anatase TiO2 deposited at low temperature by pulsing an electron cyclotron wave resonance plasma source. Sci Rep, 10 21952.   
Last edited by: Richard Baschera 2021-01-14 08:19:58 Pop. 0.75%
Keraudy, J., Molleja, G. J., Ferrec, A., Corraze, B., Richard-Plouet, M., Goullet, A. & Jouan, P. .-Y. (2015) Structural, morphological and electrical properties of nickel oxide thin films deposited by reactive sputtering. Appl. Surf. Sci. 357 838–844.   
Added by: Laurent Cournède 2016-03-10 18:36:40 Pop. 0.5%
Li, D., Dai, S., Goullet, A., Carette, M., Granier, A. & Landesman, J. P. (2018) Annealing and biasing effects on the structural and optical properties of PECVD-grown TiO2 films from TTIP/O-2 plasma. Journal of Materials Science-Materials in Electronics, 29 13254–13264.   
Last edited by: Richard Baschera 2018-08-20 08:30:20 Pop. 0.5%
Li, D., Goullet, A., Carette, M., Granier, A. & Landesman, J. P. (2016) Effect of growth interruptions on TiO2 films deposited by plasma enhanced chemical vapour deposition. Mater. Chem. Phys. 182 409–417.   
Last edited by: Richard Baschera 2016-10-18 09:43:35 Pop. 0.5%
Li, D., Carette, M., Granier, A., Landesman, J. P. & Goullet, A. (2015) Effect of ion bombardment on the structural and optical properties of TiO2 thin films deposited from oxygen/titanium tetraisopropoxide inductively coupled plasma. Thin Solid Films, 589 783–791.   
Added by: Laurent Cournède 2016-03-10 18:36:41 Pop. 0.5%
Li, D., Dai, S., Goullet, A. & Granier, A. (2018) The Effect of Plasma Gas Composition on the Nanostructures and Optical Properties of TiO2 Films Prepared by Helicon-PECVD. Nano, 13 1850124.   
Last edited by: Richard Baschera 2018-12-20 08:33:31 Pop. 0.5%
Li, D., Carette, M., Granier, A., Landesman, J. P. & Goullet, A. (2013) In situ spectroscopic ellipsometry study of TiO2 films deposited by plasma enhanced chemical vapour deposition. Appl. Surf. Sci. 283 234–239.   
Added by: Laurent Cournède 2016-03-10 21:23:29 Pop. 0.25%
Li, D., Zhang, W. & Goullet, A. (2020) Influence of PECVD-TiO2 film morphology and topography on the spectroscopic ellipsometry data fitting process. Mod. Phys. Lett. B, 34 2050228.   
Last edited by: Richard Baschera 2020-11-17 13:25:28 Pop. 1.75%
Li, D., Dai, S., Li, J., Zhang, C., Richard-Plouet, M., Goullet, A. & Granier, A. (2018) Microstructure and Photocatalytic Properties of TiO2-Reduced Graphene Oxide Nanocomposites Prepared by Solvothermal Method. J. Electron. Mater. 47 7372–7379.   
Last edited by: Richard Baschera 2018-12-20 08:25:02 Pop. 0.5%
Li, D., Bulou, S., Gautier, N., Elisabeth, S., Goullet, A., Richard-Plouet, M., Choquet, P. & Granier, A. (2019) Nanostructure and photocatalytic properties of TiO2 films deposited at low temperature by pulsed PECVD. Applied Surface Science, 466 63–69.   
Last edited by: Richard Baschera 2019-01-04 10:39:30 Pop. 0.5%
Li, D., Carette, M., Granier, A., Landesman, J. P. & Goullet, A. (2012) Spectroscopic ellipsometry analysis of TiO2 films deposited by plasma enhanced chemical vapor deposition in oxygen/titanium tetraisopropoxide plasma. Thin Solid Films, 522 366–371.   
Added by: Laurent Cournède 2016-03-10 21:28:38 Pop. 0.25%
Li, D., Goullet, A., Carette, M., Granier, A., Zhang, Y. & Landesman, J. P. (2016) Structural and optical properties of RF-biased PECVD TiO2 thin films deposited in an O-2/TTIP helicon reactor. Vacuum, 131 231–239.   
Last edited by: Richard Baschera 2016-10-07 09:06:54 Pop. 0.25%
Li, D., Gautier, N., Dey, B., Bulou, S., Richard-Plouet, M., Ravisy, W., Goullet, A., Choquet, P. & Granier, A. (2019) TEM analysis of photocatalytic TiO2 thin films deposited on polymer substrates by low-temperature ICP-PECVD. Applied Surface Science, 491 116–122.   
Last edited by: Richard Baschera 2019-08-23 13:35:25 Pop. 0.5%
Mitronika, M., Profili, J., Goullet, A., Stafford, L., Granier, A. & Richard-Plouet, M. (2020) Modification of the optical properties and nano-crystallinity of anatase TiO2nanoparticles thin film using low pressure O2 plasma treatment. Thin Solid Films, 709 138212.   
Last edited by: Richard Baschera 2020-11-17 14:02:26 Pop. 0.75%
Mitronika, M., Villeneuve-Faure, C., Massol, F., Boudou, L., Ravisy, W., Besland, M. P., Goullet, A. & Richard-Plouet, M. (2021) TiO2-SiO2 mixed oxide deposited by low pressure PECVD: Insights on optical and nanoscale electrical properties. Applied Surface Science, 541 148510.   
Last edited by: Richard Baschera 2021-02-12 09:48:29 Pop. 1%
Nguyen, D. T., Ferrec, A., Keraudy, J., Richard-Plouet, M., Goullet, A., Cattin, L., Brohan, L. & Jouan, P. .-Y. (2014) Ellipsometric and XPS characterization of transparent nickel oxide thin films deposited by reactive HiPIMS. Surf. Coat. Technol. 250 21–25.   
Added by: Laurent Cournède 2016-03-10 21:01:55 Pop. 0.5%
Ravisy, W., Richard-Plouet, M., Dey, B., Bulou, S., Choquet, P., Granier, A. & Goullet, A. (2021) Unveiling a critical thickness in photocatalytic TiO2 thin films grown by plasma-enhanced chemical vapor deposition using real time in situ spectroscopic ellipsometry. J. Phys. D: Appl. Phys. 54 445303.   
Last edited by: Richard Baschera 2021-10-01 08:42:39 Pop. 1.25%
Rouahi, A., Kahouli, A., Challali, F., Besland, M. P., Vallee, C., Pairis, S., Yangui, B., Salimy, S., Goullet, A. & Sylvestre, A. (2012) Dielectric relaxation study of amorphous TiTaO thin films in a large operating temperature range. J. Appl. Phys. 112 094104.   
Added by: Laurent Cournède 2016-03-10 21:28:38 Pop. 0.25%
Rouahi, A., Kahouli, A., Challali, F., Besland, M. P., Vallee, C., Yangui, B., Salimy, S., Goullet, A. & Sylvestre, A. (2013) Impedance and electric modulus study of amorphous TiTaO thin films: highlight of the interphase effect. J. Phys. D-Appl. Phys. 46 065308.   
Added by: Laurent Cournède 2016-03-10 21:23:31 Pop. 0.25%
Rouahi, A., Challali, F., Dakhlaoui, I., Vallee, C., Salimy, S., Jomni, F., Yangui, B., Besland, M. P., Goullet, A. & Sylvestre, A. (2016) Structural and dielectric characterization of sputtered Tantalum Titanium Oxide thin films for high temperature capacitor applications. Thin Solid Films, 606 127–132.   
Last edited by: Richard Baschera 2016-06-03 13:58:09 Pop. 0.5%
Salimy, S., Challali, F., Goullet, A., Besland, M. .-P., Carette, M., Gautier, N., Rhallabi, A., Landesman, J. P., Toutain, S. & Averty, D. (2013) Electrical Characteristics of TiTaO Thin Films Deposited on SiO2/Si Substrates by Magnetron Sputtering. ECS Solid State Lett. 2 Q13–Q15.   
Added by: Laurent Cournède 2016-03-10 21:23:32 Pop. 0.25%
wikindx 4.2.2 ©2014 | Références totales : 2654 | Requêtes métadonnées : 153 | Exécution de script : 0.25437 secs | Style : Harvard | Bibliographie : Bibliographie WIKINDX globale