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| Begou, T., Beche, B., Goullet, A., Landesman, J. P., Granier, A., Cardinaud, C., Gaviot, E., Camberlein, L., Grossard, N., Jezequel, G. & Zyss, J. (2007) First developments for photonics integrated on plasma-polymer-HMDSO: Single-mode TE00-TM00 straight waveguides. Opt. Mater. 30 657–661. |
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| Begou, T., Beche, B., Grossard, N., Zyss, J., Goullet, A., Jezequel, G. & Gaviot, E. (2008) Marcatili's extended approach: comparison to semi-vectorial methods applied to pedestal waveguide design. J. Opt. A-Pure Appl. Opt. 10 055310. |
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| Begou, T., Becheb, B., Goullet, A., Granier, A., Cardinaud, C., Gaviot, E., Raballand, V., Landesman, J. P. & Zyss, J. (2006) Photonics integrated circuits on plasma-polymer-HMDSO: Single-mode TE(00)-TM(00) straight waveguides, S-bends, Y-junctions and mach-zehnder interferometers. Iecon 2006 - 32nd Annual Conference on Ieee Industrial Electronics, Vols 1-11 New York. |
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| Bousquet, A., Goullet, A., Leteinturier, C., Coulon, N. & Granier, A. (2008) Influence of ion bombardment on structural and electrical properties of SiO2 thin films deposited from O-2/HMDSO inductively coupled plasmas under continuous wave and pulsed modes. Eur. Phys. J.-Appl. Phys, 42 3–8. |
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| Bousquet, A., Bursikova, V., Goullet, A., Djouadi, A., Zajickova, L. & Granier, A. (2006) Comparison of structure and mechanical properties of SiO(2)-like films deposited in O(2)/HMDSO pulsed and continuous plasmas. Surf. Coat. Technol. 200 6517–6521. |
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| Bousquet, A., Granier, A., Cartry, G. & Goullet, A. (2008) Kinetics of O and H atoms in pulsed O(2)/HMDSO low pressure PECVD plasmas. J. Optoelectron. Adv. Mater. 10 1999–2002. |
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| Bousquet, A., Granier, A., Goullet, A. & Landesman, J. P. (2006) Influence of plasma pulsing on the deposition kinetics and film structure in low pressure oxygen/hexamethyldisiloxane radiofrequency plasmas. Thin Solid Films, 514 45–51. |
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| Challali, F., Besland, M. P., Benzeggouta, D., Borderon, C., Hugon, M. C., Salimy, S., Saubat, J. C., Charpentier, A., Averty, D., Goullet, A. & Landesman, J. P. (2010) Investigation of BST thin films deposited by RF magnetron sputtering in pure Argon. Thin Solid Films, 518 4619–4622. |
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| Chouteau, S., Stafford, L., Granier, A., Goullet, A. & Richard-Plouet, M. (2024) Handling Nanoparticle Content in Nanocomposite Thin Films Deposited by Misty Plasma Processes through Controlled Flash Boiling Atomization. Langmuir, 40 3015–3023. |
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| Li, D., Carette, M., Granier, A., Landesman, J. P. & Goullet, A. (2015) Effect of ion bombardment on the structural and optical properties of TiO2 thin films deposited from oxygen/titanium tetraisopropoxide inductively coupled plasma. Thin Solid Films, 589 783–791. |
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| Li, D., Gautier, N., Dey, B., Bulou, S., Richard-Plouet, M., Ravisy, W., Goullet, A., Choquet, P. & Granier, A. (2019) TEM analysis of photocatalytic TiO2 thin films deposited on polymer substrates by low-temperature ICP-PECVD. Applied Surface Science, 491 116–122. |
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| Ravisy, W., Richard-Plouet, M., Dey, B., Bulou, S., Choquet, P., Granier, A. & Goullet, A. (2021) Unveiling a critical thickness in photocatalytic TiO2 thin films grown by plasma-enhanced chemical vapor deposition using real time in situ spectroscopic ellipsometry. J. Phys. D: Appl. Phys. 54 445303. |
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| Rouahi, A., Challali, F., Dakhlaoui, I., Vallee, C., Salimy, S., Jomni, F., Yangui, B., Besland, M. P., Goullet, A. & Sylvestre, A. (2016) Structural and dielectric characterization of sputtered Tantalum Titanium Oxide thin films for high temperature capacitor applications. Thin Solid Films, 606 127–132. |
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| Last edited by: Richard Baschera 2016-06-03 13:58:09 |
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| Salimy, S., Challali, F., Goullet, A., Besland, M. .-P., Carette, M., Gautier, N., Rhallabi, A., Landesman, J. P., Toutain, S. & Averty, D. (2013) Electrical Characteristics of TiTaO Thin Films Deposited on SiO2/Si Substrates by Magnetron Sputtering. ECS Solid State Lett. 2 Q13–Q15. |
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| Villeneuve-Faure, C., Mitronika, M., Dan, A. P., Boudou, L., Ravisy, W., Besland, M. P., Richard-Plouet, M. & Goullet, A. (2024) Nanoscale dielectric properties of TiO2 in SiO2 nanocomposite deposited by hybrid PECVD method. Nano Ex. 5 015010. |
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