IMN

Biblio. IMN

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Massuyeau, F., Zhao, Y., El Mel, A. A., Yaya, A., Geschier, F., Gautron, E., Lefrant, S., Mevellec, J. Y., Ewels, C., Hsu, C.-S., Faulques, E., Wery, J. & Duvail, J. L. (2013) Improved photoconductive properties of composite nanofibers based on aligned conjugated polymer and single-walled carbon nanotubes. Nano Res. 6 149–158.   
Last edited by: Richard Baschera 2017-04-06 10:41:48 Pop. 1%
Mazerie, I., Didier, P., Razan, F., Hapiot, P., Coulon, N., Girard, A., de Sagazan, O., Floner, D. & Geneste, F. (2018) A General Approach Based on Sampled-Current Voltammetry for Minimizing Electrode Fouling in Electroanalytical Detection. Chemelectrochem, 5 144–152.   
Last edited by: Richard Baschera 2018-02-08 09:35:28 Pop. 0.75%
Mel, A.-A. E. & Bittencourt, C. (2016) In situ conversion of nanostructures from solid to hollow in transmission electron microscopes using electron beam. Nanoscale, 8 10876–10884.   
Last edited by: Richard Baschera 2016-09-28 07:53:53 Pop. 1.25%
Meyer, T., LeDain, G., Girard, A., Rhallabi, A., Bouška, M., Nemec, P., Nazabal, V. & Cardinaud, C. (2020) Etching of GeSe2 chalcogenide glass and its pulsed laser deposited thin films in SF6, SF6/Ar and SF6/O-2 plasmas. Plasma Sources Sci. Technol. 29 105006.   
Last edited by: Richard Baschera 2020-11-17 14:03:42 Pop. 1.25%
Meyer, T., Girard, A., LeDain, G., Rhallabi, A., Baudet, E., Nazabal, V., Nemec, P. & Cardinaud, C. (2021) Surface composition and micromasking effect during the etching of amorphous Ge-Sb-Se thin films in SF6 and SF6 /Ar plasmas. Applied Surface Science, 549 149192.   
Last edited by: Richard Baschera 2021-04-09 11:41:07 Pop. 2%
Meyer, T., Girard, A., Bouška, M., Baudet, E., Baillieul, M., Nemec, P., Nazabal, V. & Cardinaud, C. (2023) Mass spectrometry and in situ x-ray photoelectron spectroscopy investigations of organometallic species induced by the etching of germanium, antimony and selenium in a methane-based plasma. Plasma Sources Sci. Technol. 32 085003.   
Last edited by: Richard Baschera 2023-08-24 08:52:53 Pop. 2.75%
Minea, T. M., Bouchet-Fabre, B., Lazar, S., Point, S. & Zandbergen, H. W. (2006) Angular and local spectroscopic analysis to probe the vertical alignment of N-doped well-separated carbon nanotubes. J. Phys. Chem. B, 110 15659–15662.   
Added by: Florent Boucher 2016-05-12 13:21:36 Pop. 0.75%
Mitronika, M., Villeneuve-Faure, C., Massol, F., Boudou, L., Ravisy, W., Besland, M. P., Goullet, A. & Richard-Plouet, M. (2021) TiO2-SiO2 mixed oxide deposited by low pressure PECVD: Insights on optical and nanoscale electrical properties. Applied Surface Science, 541 148510.   
Last edited by: Richard Baschera 2021-02-12 09:48:29 Pop. 2.25%
Mitronika, M., Profili, J., Goullet, A., Gautier, N., Stephant, N., Stafford, L., Granier, A. & Richard-Plouet, M. (2021) TiO2-SiO2 nanocomposite thin films deposited by direct liquid injection of colloidal solution in an O-2/HMDSO low-pressure plasma. J. Phys. D: Appl. Phys. 54 085206.   
Last edited by: Richard Baschera 2021-01-11 08:47:24 Pop. 2%
Mitronika, M., Granier, A., Goullet, A. & Richard-Plouet, M. (2021) Hybrid approaches coupling sol-gel and plasma for the deposition of oxide-based nanocomposite thin films: a review. SN Appl. Sci. 3 665.   
Last edited by: Richard Baschera 2022-08-18 08:59:42 Pop. 1.75%
Mitronika, M., Profili, J., Goullet, A., Stafford, L., Granier, A. & Richard-Plouet, M. (2020) Modification of the optical properties and nano-crystallinity of anatase TiO2nanoparticles thin film using low pressure O2 plasma treatment. Thin Solid Films, 709 138212.   
Last edited by: Richard Baschera 2020-11-17 14:02:26 Pop. 1.5%
Molamohammadi, M., Arman, A., Achour, A., Astinchap, B., Ahmadpourian, A., Boochani, A., Naderi, S. & Ahmadpourian, A. (2015) Microstructure and optical properties of cobalt-carbon nanocomposites prepared by RF-sputtering. J. Mater. Sci.-Mater. Electron. 26 5964–5969.   
Added by: Laurent Cournède 2016-03-10 18:36:41 Pop. 1%
Nguyen, D. T., Ferrec, A., Keraudy, J., Richard-Plouet, M., Goullet, A., Cattin, L., Brohan, L. & Jouan, P. .-Y. (2014) Ellipsometric and XPS characterization of transparent nickel oxide thin films deposited by reactive HiPIMS. Surf. Coat. Technol. 250 21–25.   
Added by: Laurent Cournède 2016-03-10 21:01:55 Pop. 1%
Nguyen, D. T., Ferrec, A., Keraudy, J., Bernede, J. C., Stephant, N., Cattin, L. & Jouan, P. .-Y. (2014) Effect of the deposition conditions of NiO anode buffer layers in organic solar cells, on the properties of these cells. Appl. Surf. Sci. 311 110–116.   
Added by: Laurent Cournède 2016-03-10 21:01:55 Pop. 1%
Nouveau, C., Labidi, C., Collet, R., Benlatreche, Y. & Djouadi, M. .-A. (2009) Effect of surface finishing such as sand-blasting and CrAlN hard coatings on the cutting edge's peeling tools' wear resistance. Wear, 267 1062–1067.   
Added by: Laurent Cournède 2016-03-10 21:41:24 Pop. 0.75%
Nouveau, C., Labidi, C., Martin, F. J. .-P., Collet, R. & Djouadi, A. (2007) Application of CrAlN coatings on carbide substrates in routing of MDF. Wear, 263 1291–1299.   
Added by: Laurent Cournède 2016-03-10 22:02:29 Pop. 1%
Ondracka, P., Holec, D., Necas, D., Kedronova, E., Elisabeth, S., Goullet, A. & Zajickova, L. (2017) Optical properties of TixSi1-xO2 solid solutions. Physical Review B, 95 195163.   
Last edited by: Richard Baschera 2017-07-10 12:46:40 Pop. 0.75%
Ondracka, P., Necas, D., Carette, M., Elisabeth, S., Holec, D., Granier, A., Goullet, A., Zajickova, L. & Richard-Plouet, M. (2020) Unravelling local environments in mixed TiO2-SiO2 thin films by XPS and ab initio calculations. Appl. Surf. Sci. 510 145056.   
Last edited by: Richard Baschera 2020-03-13 14:52:57 Pop. 1.25%
Ouldhamadouche, N., Achour, A., Musa, I., Aissa, A. K., Massuyeau, F., Jouan, P. Y., Kechouane, M., Le Brizoual, L., Faulques, E., Barreau, N. & Djouadi, M. A. (2012) Structural and photoluminescence characterization of vertically aligned multiwalled carbon nanotubes coated with ZnO by magnetron sputtering. Thin Solid Films, 520 4816–4819.   
Added by: Laurent Cournède 2016-03-10 21:28:39 Pop. 0.75%
Pateau, A., Rhallabi, A., Fernandez, M.-C., Boufnichel, M. & Roqueta, F. (2014) Modeling of inductively coupled plasma SF6/O-2/Ar plasma discharge: Effect of O-2 on the plasma kinetic properties. J. Vac. Sci. Technol. A, 32 021303.   
Added by: Florent Boucher 2016-04-29 09:26:44 Pop. 0.75%
Peckus, D., Chauvin, A., Tamulevicius, T., Juodenas, M., Ding, J., Choi, C.-H., El Mel, A.-A., Tessier, P.-Y. & Tamulevicius, S. (2019) Polarization-dependent ultrafast plasmon relaxation dynamics in nanoporous gold thin films and nanowires. Journal of Physics D-Applied Physics, 52 225103.   
Last edited by: Richard Baschera 2019-04-05 07:44:25 Pop. 1.75%
Pelletier, N., Beche, B., Gaviot, E., Camberlein, L., Grossard, N., Polet, F. & Zyss, J. (2006) Single-mode rib optical waveguides on SOG/SU-8 polymer and integrated Mach-Zehnder for designing thermal sensors. IEEE Sens. J. 6 565–570.   
Added by: Florent Boucher 2016-05-12 13:21:37 Pop. 0.75%
Pereira, J., Pichon, L. E., Dussart, R., Cardinaud, C., Duluard, C. Y., Oubensaid, E. H., Lefaucheux, P., Boufnichel, M. & Ranson, P. (2009) In situ x-ray photoelectron spectroscopy analysis of SiOxFy passivation layer obtained in a SF6/O-2 cryoetching process. Appl. Phys. Lett. 94 071501.   
Added by: Laurent Cournède 2016-03-10 21:41:24 Pop. 1%
Piet, J., Faider, W., Girard, A., Boulard, F. & Cardinaud, C. (2020) Investigation of organic precursors and plasma mixtures allowing control of carbon passivation when etching HgCdTe in hydrocarbon-based inductively coupled plasmas. Journal of Vacuum Science & Technology A, 38 053005.   
Last edited by: Richard Baschera 2020-11-17 13:38:54 Pop. 1.25%
Pinheiro, D., Vieira, M. T. & Djouadi, M. .-A. (2009) Advantages of depositing multilayer coatings for cutting wood-based products. Surf. Coat. Technol. 203 3197–3205.   
Added by: Laurent Cournède 2016-03-10 21:41:23 Pop. 1%
Plujat, B., Glenat, H., Hamon, J., Gazal, Y., Goullet, A., Hernandez, E., Quoizola, S. & Thomas, L. (2018) Near-field scanning microscopy and physico-chemical analysis versus time of SiCN:H thin films grown in Ar/NH3/TMS gas mixture using MW-Plasma CVD at 400 degrees C. Plasma Processes and Polymers, 15 e1800066.   
Last edited by: Richard Baschera 2018-12-19 10:39:39 Pop. 1%
Plujat, B., Glenat, H., Bousquet, A., Frezet, L., Hamon, J., Goullet, A., Tomasella, E., Hernandez, E., Quoizola, S. & Thomas, L. (2020) SiCN:H thin films deposited by MW-PECVD with liquid organosilicon precursor: Gas ratio influence versus properties of the deposits. Plasma Process. Polym. 17 e1900138.   
Last edited by: Richard Baschera 2020-04-24 08:36:50 Pop. 2%
Point, S., Minea, T., Besland, M. P. & Granier, A. (2006) Characterization of carbon nanotubes and carbon nitride nanofibres synthesized by PECVD. Eur. Phys. J.-Appl. Phys, 34 157–163.   
Added by: Florent Boucher 2016-05-12 13:21:37 Pop. 0.75%
Querre, M., Janod, E., Cario, L., Tranchant, J., Corraze, B., Bouquet, V., Deputier, S., Cordier, S., Guilloux-Viry, M. & Besland, M.-P. (2016) Metal-insulator transitions in (V1-xCrx)(2)O-3 thin films deposited by reactive direct current magnetron co-sputtering. Thin Solid Films, 617 56–62.   
Last edited by: Richard Baschera 2016-12-23 15:06:05 Pop. 1.5%
Querre, M., Tranchant, J., Corraze, B., Cordier, S., Bouquet, V., Deputier, S., Guilloux-Viry, M., Besland, M. .-P., Janod, E. & Cario, L. (2018) Non-volatile resistive switching in the Mott insulator (V1-xCrx)(2)O-3. Physica B-Condensed Matter, 536 327–330.   
Last edited by: Richard Baschera 2018-07-24 12:50:23 Pop. 1%
Raballand, V., Cartry, G. & Cardinaud, C. (2007) Porous SiOCH, SiCH and SiO2 etching in high density fluorocarbon plasma with a pulsed bias. Plasma Process. Polym. 4 563–573.   
Added by: Laurent Cournède 2016-03-10 22:02:29 Pop. 1%
Raballand, V., Cartry, G. & Cardinaud, C. (2007) A model for Si, SiCH, SiO2, SiOCH, and porous SiOCH etch rate calculation in inductively coupled fluorocarbon plasma with a pulsed bias: Importance of the fluorocarbon layer. J. Appl. Phys. 102 063306.   
Added by: Laurent Cournède 2016-03-10 22:02:29 Pop. 0.75%
Rahmane, S., Abdallah, B., Soussou, A., Gautron, E., Jouan, P. .-Y., Le Brizoual, L., Barreau, N., Soltani, A. & Djouadi, M. A. (2010) Epitaxial growth of ZnO thin films on AlN substrates deposited at low temperature by magnetron sputtering. Phys. Status Solidi A-Appl. Mat. 207 1604–1608.   
Added by: Laurent Cournède 2016-03-10 21:37:32 Pop. 0.75%
Rammal, M., Rhallabi, A., Neel, D., Make, D., Shen, A. & Djouadi, A. (2019) AlN Etching under ICP Cl-2/BCl3/Ar Plasma Mixture: Experimental Characterization and Plasma Kinetic Model. Mrs Advances, 4 1579–1587.   
Last edited by: Richard Baschera 2019-07-17 09:52:59 Pop. 1%
Ravisy, W., Richard-Plouet, M., Dey, B., Bulou, S., Choquet, P., Granier, A. & Goullet, A. (2021) Unveiling a critical thickness in photocatalytic TiO2 thin films grown by plasma-enhanced chemical vapor deposition using real time in situ spectroscopic ellipsometry. J. Phys. D: Appl. Phys. 54 445303.   
Last edited by: Richard Baschera 2021-10-01 08:42:39 Pop. 2.25%
Raza, M., Sanna, S., dos Santos Gomez, L., Gautron, E., El Mel, A. A., Pryds, N., Snyders, R., Konstantinidis, S. & Esposito, V. (2018) Near interface ionic transport in oxygen vacancy stabilized cubic zirconium oxide thin films. Phys. Chem. Chem. Phys. 20 26068–26071.   
Last edited by: Richard Baschera 2018-12-20 08:31:26 Pop. 1%
Renaud, A., Nguyen, T. K. N., Grasset, F., Raissi, M., Guillon, V., Delabrouille, F., Dumait, N., Jouan, P. .-Y., Cario, L., Jobic, S., Pellegrin, Y., Odobel, F., Cordier, S. & Uchikoshi, T. (2019) Preparation by electrophoretic deposition of molybdenum iodide cluster-based functional nanostructured photoelectrodes for solar cells. Electrochimica Acta, 317 737–745.   
Last edited by: Richard Baschera 2019-08-22 13:59:52 Pop. 1.25%
Renaud, A., Jouan, P.-Y., Dumait, N., Ababou-Girard, S., Barreau, N., Uchikoshi, T., Grasset, F., Jobic, S. & Cordier, S. (2022) Evidence of the Ambipolar Behavior of Mo-6 Cluster Iodides in All-Inorganic Solar Cells: A New Example of Nanoarchitectonic Concept. ACS Appl. Mater. Interfaces, 14 1347–1354.   
Last edited by: Richard Baschera 2022-01-14 08:06:23 Pop. 2.5%
Rhallabi, A., Chanson, R., Landesman, J. .-P., Cardinaud, C. & Fernandez, M. .-C. (2011) Atomic scale study of InP etching by Cl-2-Ar ICP plasma discharge. Eur. Phys. J.-Appl. Phys, 53 33606.   
Added by: Laurent Cournède 2016-03-10 21:32:21 Pop. 1%
Rhallabi, A., Liu, B., Landesman, J. P. & Lecler, J. L. (2006) InP etching by chlorine ICP plasma for photonic crystal applications: Experiments and simulations New York, Ieee.   
Added by: Florent Boucher 2016-05-12 13:21:38 Pop. 1%
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