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Tran, D. D., Mannequin, C., Bonvalot, M., Traoré, A., Mariette, H., Sasaki, M. & Gheeraert, E. (2024) Thermal catalytic etching of diamond by double-metal layers. Diamond and Related Materials, 145 111075. 
Added by: Richard Baschera (2024-06-10 10:04:00)   Last edited by: Richard Baschera (2024-06-10 10:08:58)
Type de référence: Article
DOI: 10.1016/j.diamond.2024.111075
Numéro d'identification (ISBN etc.): 0925-9635
Clé BibTeX: Tran2024
Voir tous les détails bibliographiques
Catégories: INTERNATIONAL, PCM
Mots-clés: Anisotropic etching, Catalytic etching, diamond, hydrogen, Solid solution reaction, solubility
Créateurs: Bonvalot, Gheeraert, Mannequin, Mariette, Sasaki, Tran, Traoré
Collection: Diamond and Related Materials
Consultations : 5/5
Indice de consultation : 21%
Indice de popularité : 5.25%
Liens URLs     https://www.scienc ... /S0925963524002887
Résumé     
We introduce a novel technique for thermal catalytic etching of single-crystal diamond under hydrogen atmosphere using a double-metal layer consisting of two different metallic thin films. Surface phenomena, catalytic activity, hydrogen pressure dependence and etch rates in several double-metal layer configurations were investigated. We observe that etching with an optimized thickness ratio of Ni/Pd films increases the etch rate by a factor up to 11 compared to etching with a single-metal layer Ni film. The proposed double-metal layer technique enhances hydrogen absorption, which contributes to an increased etch rate of the process, as compared to conventional single-metal layer thermal catalytic etching. Moreover, the etched pattern shows smooth (111) plane sidewalls and flat (100) step-terrace bottom features.
  
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