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Asbani, B., Robert, K., Roussel, P., Brousse, T. & Lethien, C. (2021) Asymmetric micro-supercapacitors based on electrodeposited Ruo(2) and sputtered VN films. Energy Storage Materials, 37 207–214.
Added by: Richard Baschera (2021-04-15 07:49:33) Last edited by: Richard Baschera (2021-04-15 08:03:58) |
| Type de référence: Article DOI: 10.1016/j.ensm.2021.02.006 Numéro d'identification (ISBN etc.): 2405-8297 Clé BibTeX: Asbani2021 Voir tous les détails bibliographiques  |
Catégories: ST2E Mots-clés: Asymmetric micro-supercapacitors, electrodeposition, hydrous ruthenium oxide, Sputtering, thin films, vanadium nitride Créateurs: Asbani, Brousse, Lethien, Robert, Roussel Collection: Energy Storage Materials |
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| Liens URLs https://www.scienc ... /S2405829721000490 |
| Résumé |
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Research on micro-supercapacitors remains one of the most important activities in the area of electrochemical energy storage for powering smart and miniaturized electronic devices. Here we design an asymmetric micro-supercapacitor (A-MSC) combining sputtered vanadium nitride film (VN) and electrodeposited hydrous ruthenium oxide (hRuO2) film. Taking advantage of their complementary electrochemical potential windows in 1 M KOH electrolyte, the A-MSC achieves a cell voltage up to 1.15 V, associated to high specific capacitance values for the device (≈ 100 mF cm−2). The energy density of this asymmetric VN / hRuO2 micro-supercapacitor reaches 20 µWh cm−2 at a power density of 3 mW cm−2. Taking benefit from the asymmetric configuration, a 5-fold enhancement factor in energy density is demonstrated for the VN / hRuO2 asymmetric micro-supercapacitor as compared to symmetric VN / VN and hRuO2 / hRuO2 microdevices.
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