IMN

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Bouhtiyya, S., Porto, L. R., Laik, B., Boulet, P., Capon, F., Pereira-Ramos, J. P., Brousse, T. & Pierson, J. F. (2013) Application of sputtered ruthenium nitride thin films as electrode material for energy-storage devices. Scr. Mater. 68 659–662. 
Added by: Laurent Cournède (2016-03-10 21:23:31)
Type de référence: Article
DOI: 10.1016/j.scriptamat.2013.01.030
Numéro d'identification (ISBN etc.): 1359-6462
Clé BibTeX: Bouhtiyya2013
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Catégories: ST2E
Mots-clés: 1st-principles, anode material, electrode material, Lithium-ion batteries, metal nitride, nitrogen, Reactive sputtering, Ruthenium nitride, Structure, vanadium nitride
Créateurs: Bouhtiyya, Boulet, Brousse, Capon, Laik, Pereira-Ramos, Pierson, Porto
Collection: Scr. Mater.
Consultations : 8/405
Indice de consultation : 2%
Indice de popularité : 0.5%
Résumé     
RuN films that crystallized in the ZnS-like structure with [111] preferred orientation have been deposited by reactive sputtering. Preliminary results are reported on the electrochemical properties of such films as electrode materials for supercapacitors and lithium-ion batteries. Cyclic voltammetric experiments indicate an attractive capacitance value of 37 F g(-1). Moreover, galvanostatic measurements indicate that RuN films reversibly react with lithium through a conversion reaction with Ru(0) nanoparticle formation. A high capacity value of similar to 700 mAh g(-1) at C/2 rate is achievable. (C) 2013 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.
Added by: Laurent Cournède  
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