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El Mel, A. A., Ershov, S., Britun, N., Ricard, A., Konstantinidis, S. & Snyders, R. (2015) Combined optical emission and resonant absorption diagnostics of an Ar-O-2-Ce-reactive magnetron sputtering discharge. Spectroc. Acta Pt. B-Atom. Spectr. 103 99–105. 
Added by: Laurent Cournède (2016-03-10 18:36:43)
Type de référence: Article
DOI: 10.1016/j.sab.2014.11.009
Numéro d'identification (ISBN etc.): 0584-8547
Clé BibTeX: ElMel2015b
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Catégories: PCM
Mots-clés: Argon metastables, Cerium, cerium oxide, deposition, gas temperature, glow-discharge, langmuir probe, laser-induced fluorescence, Magnetron sputtering, mass-spectrometry, microwave discharges, Optical absorption spectroscopy, Optical emission spectroscopy, oxide thin-films, spectroscopy
Créateurs: Britun, El Mel, Ershov, Konstantinidis, Ricard, Snyders
Collection: Spectroc. Acta Pt. B-Atom. Spectr.
Consultations : 9/440
Indice de consultation : 2%
Indice de popularité : 0.5%
Résumé     
We report the results on combined optical characterization of Ar-O-2-Ce magnetron sputtering discharges by optical emission and resonant absorption spectroscopy. In this study, a DC magnetron sputtering system equipped with a movable planar magnetron source with a Ce target is used. The intensities of Ar, O, and Ce emission lines, as well as the absolute densities of Ar metastable and Ce ground state atoms are analyzed as a function of the distance from the magnetron target, applied DC power, O-2 content, etc. The absolute number density of the Arm is found to decrease exponentially as a function of the target-to-substrate distance. The rate of this decrease is dependent on the sputtering regime, which should be due to the different collisional quenching rates of Ar-m by O-2 molecules at different oxygen contents. Quantitatively, the absolute number density of Ar-m is found to be equal to approximate to 3 x 10(8) cm(-3) in the metallic, and approximate to 5 x 10(7) cm(-3) in the oxidized regime of sputtering, whereas Ce ground state densities at the similar conditions are found to be few times lower. The absolute densities of species are consistent with the corresponding deposition rates, which decrease sharply during the transition from metallic to poisoned sputtering regime. (C) 2014 Elsevier B.V. All rights reserved.
Added by: Laurent Cournède  
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