IMN

Biblio. IMN

Référence en vue solo

Bouchoule, S., Chanson, R., Pageau, A., Cambril, E., Guilet, S., Rhallabi, A. & Cardinaud, C. (2015) Surface chemistry of InP ridge structures etched in Cl-2-based plasma analyzed with angular XPS. J. Vac. Sci. Technol. A, 33 05E124. 
Added by: Laurent Cournède (2016-03-10 18:36:41)
Type de référence: Article
DOI: 10.1116/1.4927541
Numéro d'identification (ISBN etc.): 0734-2101
Clé BibTeX: Bouchoule2015
Voir tous les détails bibliographiques
Catégories: PCM
Mots-clés: chlorine, cl-2-h-2, cl-2/n-2, etching process, fabrication, heterostructures, inductively-coupled plasma, mixtures, ray photoelectron-spectroscopy, trenches
Créateurs: Bouchoule, Cambril, Cardinaud, Chanson, Guilet, Pageau, Rhallabi
Collection: J. Vac. Sci. Technol. A
Consultations : 10/437
Indice de consultation : 1%
Indice de popularité : 0.25%
Résumé     
Two x-ray photoelectron spectroscopy configurations are proposed to analyze the surface chemistry of micron-scale InP ridge structures etched in chlorine-based inductively coupled plasma (ICP). Either a classical or a grazing configuration allows to retrieve information about the surface chemistry of the bottom surface and sidewalls of the etched features. The procedure is used to study the stoichiometry of the etched surface as a function of ridge aspect ratio for Cl-2/Ar and Cl-2/H-2 plasma chemistries. The results show that the bottom surface and the etched sidewalls are P-rich, and indicate that the P-enrichment mechanism is rather chemically driven. Results also evidence that adding H-2 to Cl-2 does not necessarily leads to a more balanced surface stoichiometry. This is in contrast with recent experimental results obtained with the HBr ICP chemistry for which fairly stoichiometric surfaces have been obtained. (C) 2015 American Vacuum Society.
Added by: Laurent Cournède  
wikindx 4.2.2 ©2014 | Références totales : 2497 | Requêtes métadonnées : 63 | Exécution de script : 0.11852 secs | Style : Harvard | Bibliographie : Bibliographie WIKINDX globale