Achour, A., Lucio Porto, R., Soussou, M.-A., Islam, M., Boujtita, M., Aissa, K. A., Le Brizoual, L., Djouadi, A. & Brousse, T. (2015) Titanium nitride films for micro-supercapacitors: Effect of surface chemistry and film morphology on the capacitance. J. Power Sources, 300 525–532.
Added by: Richard Baschera (2016-03-10 18:36:40) Last edited by: Richard Baschera (2020-09-11 17:00:49)
|Type de référence: Article
Numéro d'identification (ISBN etc.): 0378-7753
Clé BibTeX: Achour2015
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|Catégories: ID2M, INTERNATIONAL, ST2E
Mots-clés: carbon-films, DC-sputtering, electrochemical capacitor, Electrochemical capacitors, Electrodes, nanotube arrays, oxynitride, Porous films, raman-scattering, thin-films, TiN films, tio2, vanadium nitride, visible-light photocatalysis
Créateurs: Achour, Aissa, Boujtita, Brousse, Djouadi, Islam, Le Brizoual, Lucio Porto, Soussou
Collection: J. Power Sources
Consultations : 5/718
Indice de consultation : 2%
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Electrochemical capacitors (EC) in the form of packed films can be integrated in various electronic devices as power source. A fabrication process of EC electrodes, which is compatible with micro-fabrication, should be addressed for practical applications. Here, we show that titanium nitride films with controlled porosity can be deposited on flat silicon substrates by reactive DC-sputtering for use as high performance micro-supercapacitor electrodes. A superior volumetric capacitance as high as 146.4 F cm(-3), with an outstanding cycling stability over 20,000 cycles, was measured in mild neutral electrolyte of potassium sulfate. The specific capacitance of the films as well as their capacitance retentions were found to depend on thickness, porosity and surface chemistry of electrodes. The one step process used to fabricate these TiN electrodes and the wide use of this material in the field of semiconductor technology make it promising for miniaturized energy storage systems. (C) 2015 Elsevier B.V. All rights reserved.