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Moeini, B., Linford, M. R., Fairley, N., Barlow, A., Cumpson, P., Morgan, D., Fernandez, V. & Baltrusaitis, J. (2021) Definition of a new (Doniach-Sunjic-Shirley) peak shape for fitting asymmetric signals applied to reduced graphene oxide/graphene oxide XPS spectra. Surface and Interface Analysis, n/a. 
Added by: Richard Baschera (2021-11-04 14:39:20)   Last edited by: Richard Baschera (2021-11-04 14:42:28)
Type de référence: Article
DOI: 10.1002/sia.7021
Numéro d'identification (ISBN etc.): 1096-9918
Clé BibTeX: Moeini2021a
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Catégories: IMN, INTERNATIONAL
Mots-clés: Data processing, Graphene oxide, peak shape, reduced graphene oxide, XPS
Créateurs: Baltrusaitis, Barlow, Cumpson, Fairley, Fernandez, Linford, Moeini, Morgan
Collection: Surface and Interface Analysis
Consultations : 13/175
Indice de consultation : 10%
Indice de popularité : 2.5%
Liens URLs     https://onlinelibr ... s/10.1002/sia.7021
Résumé     
The existence of asymmetry in X-ray photoelectron spectroscopy (XPS) photoemission lines is widely accepted, but line shapes designed to accommodate asymmetry are generally lacking in theoretical justification. In this work, we present a new line shape for describing asymmetry in XPS signals that is based on two facts. First, the most widely known line shape for fitting asymmetric XPS signals that has a theoretical basis, referred to as the Doniach-Sunjic (DS) line shape, suffers from a mathematical inconvenience, which is that for asymmetric shapes the area beneath the curve (above the x-axis) is infinite. Second, it is common practice in XPS to remove the inelastically scattered background response of a peak in question with the Shirley algorithm. The new line shape described herein attempts to retain the theoretical virtues of the DS line shape, while allowing the use of a Shirley background, with the consequence that the resulting line shape has a finite area. To illustrate the use of this Doniach-Sunjic-Shirley (DSS) line shape, a set of spectra obtained from varying amounts of graphene oxide (GO) and reduced GO on a patterned, heterogeneous surface are fit and discussed.
  
Notes     
_eprint: https://analyticalsciencejournals.onlinelibrary.wiley.com/doi/pdf/10.1002/sia.7021
  
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