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Mitronika, M., Profili, J., Goullet, A., Gautier, N., Stephant, N., Stafford, L., Granier, A. & Richard-Plouet, M. (2021) TiO2-SiO2 nanocomposite thin films deposited by direct liquid injection of colloidal solution in an O-2/HMDSO low-pressure plasma. J. Phys. D: Appl. Phys. 54 085206. 
Added by: Richard Baschera (2021-01-11 08:45:33)   Last edited by: Richard Baschera (2021-01-11 08:47:24)
Type de référence: Article
DOI: 10.1088/1361-6463/abc84d
Numéro d'identification (ISBN etc.): 0022-3727, 1361-6463
Clé BibTeX: Mitronika2021
Voir tous les détails bibliographiques
Créateurs: Gautier, Goullet, Granier, Mitronika, Profili, Richard-Plouet, Stafford, Stephant
Collection: J. Phys. D: Appl. Phys.
Consultations : 1/290
Indice de consultation : 4%
Indice de popularité : 1%
Liens URLs     https://iopscience ... 8/1361-6463/abc84d
TiO2 nanoparticles (NPs), 3 nm in size, were injected inside a very-low-pressure O-2 plasma reactor using a liquid injector and following an iterative injection sequence. Simultaneously, hexamethyldisiloxane (HMDSO) vapor precursor was added to create a SiO2 matrix and a TiO2-SiO2 nanocomposite (NC) thin film. Both the liquid injection and vapor precursor parameters were established to address the main challenges observed when creating NCs. In contrast to most aerosol-assisted plasma deposition processes, scanning/transmission electron microscopy (S/TEM) indicated isolated (i.e. non-agglomerated) NPs distributed in a rather uniform way in the matrix. The fraction of the TiO2 NPs inside the SiO2 matrix was estimated by SEM, spectroscopic ellipsometry (SE), and x-ray photoelectron spectroscopy. All techniques provided coherent values, with percentages between 12% and 19%. Despite the presence of TiO2 NPs, SE measurements confirmed that the plasma-deposited SiO2 matrix was dense with an optical quality similar to the one of thermal silica. Finally, the percentage of TiO2 NPs inside the SiO2 matrix and the effective refractive index of the NCs can be tuned through judicious control of the injection sequence.
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