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Achour, A., Islam, M., Ahmad, I., Le Brizoual, L., Djouadi, A. & Brousse, T. (2018) Influence of surface chemistry and point defects in TiN based electrodes on electrochemical capacitive storage activity. Scripta Materialia, 153 59–62. 
Added by: Richard Baschera (2018-07-27 14:37:21)   Last edited by: Richard Baschera (2018-07-27 14:38:25)
Type de référence: Article
DOI: 10.1016/j.scriptamat.2018.04.051
Clé BibTeX: Achour2018
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Créateurs: Achour, Ahmad, Brousse, Djouadi, Islam, Le Brizoual
Collection: Scripta Materialia
Consultations : 2/796
Indice de consultation : 7%
Indice de popularité : 1.75%
The effect of surface chemistry of reactive sputtered TiN electrodes in the electrochemical capacitors (ECs) was investigated. The TiN films were produced on vertically aligned carbon nanotubes. X-ray photoelectron spectroscopy analysis revealed surface defects generation with no effect on morphology. Cyclic voltammetry experiments were performed in aqueous 0.5 M K2SO4 solution and 1 M Et4NBF4 ((tetraethylammonium tetrafluoroborate)) organic electrolyte. The presence of oxygen vacancies and Ti interstitials on the top surface layer lead to enhanced electrochemical capacitive charge storage. Such findings open the way to design nitride films with optimized surface chemistry for use in the ECs. (C) 2018 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.
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