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Bachar, A., Bousquet, A., Mehdi, H., Monier, G., Robert-Goumet, C., Thomas, L., Belmahi, M., Goullet, A., Sauvage, T. & Tomasella, E. (2018) Composition and optical properties tunability of hydrogenated silicon carbonitride thin films deposited by reactive magnetron sputtering. Applied Surface Science, 444 293–302.
Added by: Richard Baschera (2018-04-27 13:27:58) Last edited by: Richard Baschera (2018-04-27 13:28:49) |
| Type de référence: Article DOI: 10.1016/j.apsusc.2018.03.040 Clé BibTeX: Bachar2018 Voir tous les détails bibliographiques  |
Catégories: PCM Créateurs: Bachar, Belmahi, Bousquet, Goullet, Mehdi, Monier, Robert-Goumet, Sauvage, Thomas, Tomasella Collection: Applied Surface Science |
Consultations : 1/497
Indice de consultation : 5% Indice de popularité : 1.25% |
| Résumé |
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Radiofrequency reactive magnetron sputtering was used to deposit hydrogenated amorphous silicon carbonitride (a-SiCxNy: H) at 400 degrees C by sputtering a silicon target under CH4 and N-2 reactive gas mixture. Rutherford backscattering spectrometry revealed that the change of reactive gases flow rate (the ratio R = F-N2/(F-N2+ F-CH4)) induced a smooth chemical composition tunability from a silicon carbide-like film for R = 0 to a silicon nitride-like one at R = 1 with a large area of silicon carbonitrides between the two regions. The deconvolution of Fourier Transform InfraRed and X-ray photoelectron spectroscopy spectrum highlighted a shift of the chemical environment of the deposited films corresponding to the changes seen by RBS. The consequence of these observations is that a control of refractive index in the range of [1.9-2.5] at lambda = 633 nm and optical bandgap in the range [2 eV-3.8 eV] have been obtained which induces that these coatings can be used as antireflective coatings in silicon photovoltaic cells. (C) 2018 Elsevier B.V. All rights reserved.
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