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Chauvin, A., Stephant, N., Du, K., Ding, J., Wathuthanthri, I., Choi, C.-H., Tessier, P.-Y. & El Mel, A.-A. (2017) Large-Scale Fabrication of Porous Gold Nanowires via Laser Interference Lithography and Dealloying of Gold-Silver Nano-Alloys. Micromachines, 8 168. 
Added by: Richard Baschera (2017-07-17 09:36:59)   Last edited by: Richard Baschera (2017-07-17 09:37:54)
Type de référence: Article
DOI: 10.3390/mi8060168
Numéro d'identification (ISBN etc.): 2072-666X
Clé BibTeX: Chauvin2017
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Catégories: INTERNATIONAL, PCM
Créateurs: Chauvin, Choi, Ding, Du, El Mel, Stephant, Tessier, Wathuthanthri
Collection: Micromachines
Consultations : 9/416
Indice de consultation : 3%
Indice de popularité : 0.75%
Résumé     
In this work, we report on an efficient approach to fabricating large-area and uniform planar arrays of highly ordered nanoporous gold nanowires. The approach consists in dealloying Au-Ag alloy nanowires in concentrated nitric acid. The Au-Ag alloy nanowires were obtained by thermal annealing at 800 degrees C for 2 h of Au/Ag stacked nanoribbons prepared by subsequent evaporation of silver and gold through a nanograted photoresist layer serving as a mask for a lift-off process. Laser interference lithography was employed for the nanopatterning of the photoresist layer to create the large-area nanostructured mask. The result shows that for a low Au-to-Ag ratio of 1, the nanowires tend to cracks during the dealloying due to the internal residual stress generated during the dealloying process, whereas the increase of the Au-to-Ag ratio to 3 can overcome the drawback and successfully leads to the obtainment of an array of highly ordered nanoporous gold nanowires. Nanoporous gold nanowires with such well-regulated organization on a wafer-scale planar substrate are of great significance in many applications including sensors and actuators.
  
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