 |
 |
|
Achour, A., Lucio-Porto, R., Chaker, M., Arman, A., Ahmadpourian, A., Soussou, M. A., Boujtita, M., Le Brizoual, L., Djouadi, M. A. & Brousse, T. (2017) Titanium vanadium nitride electrode for micro-supercapacitors. Electrochem. Commun. 77 40–43.
Added by: Richard Baschera (2017-05-05 13:45:22) Last edited by: Richard Baschera (2017-05-05 13:48:25) |
| Type de référence: Article DOI: 10.1016/j.elecom.2017.02.011 Numéro d'identification (ISBN etc.): 1388-2481 Clé BibTeX: Achour2017 Voir tous les détails bibliographiques  |
Catégories: ID2M, INTERNATIONAL, ST2E Mots-clés: devices, Electrochemical capacitors, energy-storage, fabrication, micro-supercapacitors, thin-films, Titanium nitride, Transition metal nitride, vanadium nitride Créateurs: Achour, Ahmadpourian, Arman, Boujtita, Brousse, Chaker, Djouadi, Le Brizoual, Lucio-Porto, Soussou Collection: Electrochem. Commun. |
Consultations : 2/915
Indice de consultation : 7% Indice de popularité : 1.75% |
| Résumé |
|
Here we report on the synthesis of binary transition metal nitride electrodes based on titanium vanadium nitride (TiVN) thin films. These films were deposited by a method compatible with micro-electronic processes which consists of DC co-sputtering of vanadium (V) and titanium (Ti) targets. TiVN films with different Ti/V ratio were deposited. A dependence of the capacitance and the cycling stability with the Ti/V atomic ratio in the films was established. While V rich sample exhibits a Faradic behavior that limits its cycling ability despite a high areal and volumetric capacity, the addition of Ti in the film drastically improves the cycling ability with virtually no fade in capacitance after 10,000 cycles. Furthermore, a 1.1 Ti/V ratio leads to an areal capacitance up to 15 mF.cm(-2) in 1 M KOH electrolyte solution. Such electrodes shed light on the use of binary transition metal nitrides as candidate electrodes for micro-supercapacitor. (C) 2017 Elsevier B.V. All rights reserved.
|