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Li, D., Elisabeth, S., Granier, A., Carette, M., Goullet, A. & Landesman, J.-P. (2016) Structural and Optical Properties of PECVD TiO2-SiO2 Mixed Oxide Films for Optical Applications. Plasma Process. Polym. 13 918–928. 
Added by: Richard Baschera (2016-12-14 14:48:52)   Last edited by: Richard Baschera (2016-12-14 15:59:44)
Type de référence: Article
DOI: 10.1002/ppap.201600012
Numéro d'identification (ISBN etc.): 1612-8850
Clé BibTeX: Li2016c
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Catégories: INTERNATIONAL, PCM
Mots-clés: assisted deposition, chemical-vapor-deposition, hexamethyldisiloxane (HMDSO), ion-bombardment, optical properties, plasma, plasma-enhanced chemical vapor deposition (PECVD), silica, spectroscopic ellipsometry, thin films, thin-films, tio2, titanium-dioxide, wave-guides
Créateurs: Carette, Elisabeth, Goullet, Granier, Landesman, Li
Collection: Plasma Process. Polym.
Consultations : 9/615
Indice de consultation : 4%
Indice de popularité : 1%
Résumé     
TiO2-SiO2 mixed oxide films with variable compositions are deposited from oxygen/titanium tetraisopropoxide/hexamethyldisiloxane (HMDSO) inductively coupled radiofrequency plasmas at low temperature and pressure. The related structure, morphology, and optical properties are investigated. Results show that the [Si]/[Ti + Si] concentration ratio in the film is increased sharply from 0 (pure TiO2) to 0.48 by adding a small amount of HMDSO. The mixed films are in amorphous phase, and the formation of Ti-O-Si is revealed. With an increase of Si content: the columnar structure of TiO2 disappears, the whole film seems to be homogeneous and more compact, the grain size decreases and the top surface becomes smoother; both the refractive index and extinction coefficient are decreased, while the bandgap is increased.
  
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