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Li, D., Goullet, A., Carette, M., Granier, A., Zhang, Y. & Landesman, J. P. (2016) Structural and optical properties of RF-biased PECVD TiO2 thin films deposited in an O-2/TTIP helicon reactor. Vacuum, 131 231–239. 
Added by: Richard Baschera (2016-10-06 14:25:36)   Last edited by: Richard Baschera (2016-10-07 09:06:54)
Type de référence: Article
DOI: 10.1016/j.vacuum.2016.07.004
Numéro d'identification (ISBN etc.): 0042-207X
Clé BibTeX: Li2016a
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Mots-clés: anatase tio2, chemical-vapor-deposition, crystalline tio2, ion-bombardment, nanocrystalline tio2, optical properties, Oxides, phase-stability, plasma, plasma deposition, room-temperature, spectroscopic ellipsometry, thin films, titanium-dioxide
Créateurs: Carette, Goullet, Granier, Landesman, Li, Zhang
Collection: Vacuum
Consultations : 4/500
Indice de consultation : 3%
Indice de popularité : 0.75%
TiO2 thin films are deposited from oxygen/titanium tetraisopropoxide inductively coupled radio frequency plasmas at low temperature and pressure by a RF-biased PECVD technique. In such a process, the substrate biasing effect (V-b) on the related film composition, structure, morphology, and optical properties are investigated. The results show that the O:Ti concentration ratio in all the films is roughly in stoichiometric proportion of 2, and the binding energy difference between the 0 is and Ti 2p3/2 levels indicates the formal valence state Ti4+ in all the films. The phase transformation from anatase to rutile is identified by Raman spectroscopy. At the floating potential, the first growth stage yields a well organized columnar layer, similar to 90 nm in thickness, and this layer within a thick film (similar to 365 nm) has roughly the same optical properties as the thin film of 90 nm which is separately deposited. However, the columnar structure can be eliminated by using {textbar}V-b{textbar} {>}= 50 V. Spectroscopic ellipsometry is used to obtain the film optical properties, and appropriate fitting parameters have been found for the measured data. (C) 2016 Elsevier Ltd. All rights reserved.
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