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Dubosc, M., Minea, T., Besland, M. P., Cardinaud, C., Granier, A., Gohier, A., Point, S. & Torres, J. (2006) Low temperature plasma carbon nanotubes growth on patterned catalyst. Microelectron. Eng. 83 2427–2431. 
Added by: Florent Boucher (2016-05-12 13:21:36)
Type de référence: Article
DOI: 10.1016/j.mee.2006.10.050
Numéro d'identification (ISBN etc.): 0167-9317
Clé BibTeX: Dubosc2006
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Catégories: PCM
Mots-clés: chemical-vapor-deposition, dot, nanofibers, single, uniform
Créateurs: Besland, Cardinaud, Dubosc, Gohier, Granier, Minea, Point, Torres
Collection: Microelectron. Eng.
Consultations : 1/376
Indice de consultation : 2%
Indice de popularité : 0.5%
Résumé     
This paper reports on carbon nanotubes (CNT) arrays grown on patterned catalysts by plasma-enhanced chemical vapor deposition (PECVD). CNT growth has been performed by low pressure high-density plasma process at 700 degrees C in acetylene/ammonia mixture. Prior to CNT growth, a standard lift-off process has been used for catalyst patterning. The chemical impact of the lift-off sequence on the catalyst activity is discussed with respect to the amount of Ni pre-deposited. In particular, it discusses the impact of this wet treatment on CNT growth when the catalyst amount is lower than a threshold value. (c) 2006 Elsevier B.V. All rights reserved.
Added by: Florent Boucher  
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