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Granier, A., Begou, T., Makaoui, K., Soussou, A., Beche, B., Gaviot, E., Besland, M.-P. & Goullet, A. (2009) Influence of Ion Bombardment and Annealing on the Structural and Optical Properties of TiOx Thin Films Deposited in Inductively Coupled TTIP/O-2 Plasma. Plasma Process. Polym. 6 S741–S745. 
Added by: Laurent Cournède (2016-03-10 21:41:25)
Type de référence: Article
DOI: 10.1002/ppap.200931804
Numéro d'identification (ISBN etc.): 1612-8850
Clé BibTeX: Granier2009
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Catégories: PCM
Mots-clés: anatase, annealing, chemical-vapor-deposition, Oxygen, pe-cvd, pecvd, rutile, titanium dioxide film, ttip, x-ray
Créateurs: Beche, Begou, Besland, Gaviot, Goullet, Granier, Makaoui, Soussou
Collection: Plasma Process. Polym.
Consultations : 12/359
Indice de consultation : 2%
Indice de popularité : 0.5%
Résumé     
TiO2 films were deposited in a low-pressure inductively coupled rf plasma in O-2/titanium tetraisopropoxide (TTIP). First, depositions were realized at floating potential using nitrogen as bubbling gas. The structural and optical properties of the films were studied, before and after annealing at 450 degrees C under air. As expected, as-deposited films are amorphous, with a columnar structure. A post-annealing under flowing air allows obtaining partially crystallized films in anatase phase. Secondly, films were deposited using nitrogen and oxygen as bubbling gas. In both cases, TiO2-like films exhibit very similar structure and optical properties. Finally, the effect of biasing the substrate was investigated. An improvement of film proper-ties has been found for a bias voltage of -15 V at T {<} 100 degrees C: deposited TiO2 film is dense (3.7) with a high refractive index (n = 2.32 at 634 nm) and partially crystallized in rutile phase.
Added by: Laurent Cournède  
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