IMN

Biblio. IMN

Liste de références

Affichage de 1 - 8 de 8 (Bibliographie: Bibliographie WIKINDX globale)
Paramètres :
Mot-clé:  stress
Ordonner par

Croissant
Décroissant
Utiliser tout ce qui est coché 
Utiliser tout ce qui est affiché 
Utiliser tous les items 
Abdallah, B., Chala, A., Jouan, P. .-Y., Besland, M. P. & Djouadi, M. A. (2007) Deposition of AlN films by reactive sputtering: Effect of radio frequency substrate bias. Thin Solid Films, 515 7105–7108.   
Added by: Laurent Cournède 2016-03-10 22:02:30 Pop. 2%
Damian, A., Braems, I., Maroun, F. & Allongue, P. (2013) Electrodeposition of NiPd monolayer on Au(111): An in situ scanning tunneling microscopy study. Electrochim. Acta, 112 824–830.   
Last edited by: Richard Baschera 2016-10-21 14:00:38 Pop. 1%
Lecadre, F., Maroun, F., Braems, I., Berthier, F., Goyhenex, C. & Allongue, P. (2013) AuNi alloy monolayer films electrodeposited on Au(111): An in situ STM study. Surf. Sci. 607 25–32.   
Last edited by: Richard Baschera 2016-10-21 14:01:22 Pop. 1%
Marie, J. B., Braems, I., Bellec, A., Chacon, C., Creuze, J., Girard, Y., Gueddani, S., Lagoute, J., Repain, V. & Rousset, S. (2017) Incoherent Ag islands growth on Ni(100). Surf. Sci. 656 101–108.   
Last edited by: Richard Baschera 2017-02-06 15:36:11 Pop. 1.5%
Menou, E., Rame, J., Desgranges, C., Ramstein, G. & Tancret, F. (2019) Computational design of a single crystal nickel-based superalloy with improved specific creep endurance at high temperature. Comput. Mater. Sci. 170 UNSP 109194.   
Last edited by: Richard Baschera 2019-12-17 10:14:21 Pop. 1.25%
Nouveau, C., Labidi, C., Martin, F. J. .-P., Collet, R. & Djouadi, A. (2007) Application of CrAlN coatings on carbide substrates in routing of MDF. Wear, 263 1291–1299.   
Added by: Laurent Cournède 2016-03-10 22:02:29 Pop. 1%
Querre, M., Janod, E., Cario, L., Tranchant, J., Corraze, B., Bouquet, V., Deputier, S., Cordier, S., Guilloux-Viry, M. & Besland, M.-P. (2016) Metal-insulator transitions in (V1-xCrx)(2)O-3 thin films deposited by reactive direct current magnetron co-sputtering. Thin Solid Films, 617 56–62.   
Last edited by: Richard Baschera 2016-12-23 15:06:05 Pop. 1.5%
Tranchant, J., Angleraud, B., Tessier, P. Y., Besland, M. P., Landesman, J. P. & Djouadi, M. A. (2006) Residual stress control in MoCr thin films deposited by ionized magnetron sputtering. Surf. Coat. Technol. 200 6549–6553.   
Added by: Florent Boucher 2016-05-12 13:21:37 Pop. 1%
wikindx 4.2.2 ©2014 | Références totales : 2856 | Requêtes métadonnées : 58 | Exécution de script : 0.09614 secs | Style : Harvard | Bibliographie : Bibliographie WIKINDX globale