IMN

Biblio. IMN

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Aissa, A. K., Achour, A., Camus, J., Le Brizoual, L., Jouan, P. .-Y. & Djouadi, M. .-A. (2014) Comparison of the structural properties and residual stress of AlN films deposited by dc magnetron sputtering and high power impulse magnetron sputtering at different working pressures. Thin Solid Films, 550 264–267.   
Added by: Florent Boucher 2016-04-29 09:26:45 Pop. 0.75%
Bousquet, A., Granier, A., Goullet, A. & Landesman, J. P. (2006) Influence of plasma pulsing on the deposition kinetics and film structure in low pressure oxygen/hexamethyldisiloxane radiofrequency plasmas. Thin Solid Films, 514 45–51.   
Added by: Florent Boucher 2016-05-12 13:21:36 Pop. 0.5%
Jacq, S., Cardinaud, C., Le Brizoual, L. & Granier, A. (2013) H atom surface loss kinetics in pulsed inductively coupled plasmas. Plasma Sources Sci. Technol. 22 055004.   
Added by: Laurent Cournède 2016-03-10 21:23:29 Pop. 0.5%
Lallement, L., Gosse, C., Cardinaud, C., Peignon-Fernandez, M. .-C. & Rhallabi, A. (2010) Etching studies of silica glasses in SF6/Ar inductively coupled plasmas: Implications for microfluidic devices fabrication. J. Vac. Sci. Technol. A, 28 277–286.   
Added by: Laurent Cournède 2016-03-10 21:37:33 Pop. 0.5%
Lallement, L., Rhallabi, A., Cardinaud, C. & Fernandez, M. C. P. (2011) Modelling of fluorine based high density plasma for the etching of silica glasses. J. Vac. Sci. Technol. A, 29 051304.   
Added by: Laurent Cournède 2016-03-10 21:32:20 Pop. 0.5%
Raballand, V., Cartry, G. & Cardinaud, C. (2007) Porous SiOCH, SiCH and SiO2 etching in high density fluorocarbon plasma with a pulsed bias. Plasma Process. Polym. 4 563–573.   
Added by: Laurent Cournède 2016-03-10 22:02:29 Pop. 0.5%
Supiot, P., Vivien, C., Granier, A., Bousquet, A., Mackova, A., Escaich, D., Clergereaux, R., Raynaud, P., Stryhal, Z. & Pavlik, J. (2006) Growth and modification of organosilicon films in PECVD and remote afterglow reactors. Plasma Process. Polym. 3 100–109.   
Added by: Florent Boucher 2016-05-12 13:21:37 Pop. 0.5%
Tranchant, J., Angleraud, B., Tessier, P. Y., Besland, M. P., Landesman, J. P. & Djouadi, M. A. (2006) Residual stress control in MoCr thin films deposited by ionized magnetron sputtering. Surf. Coat. Technol. 200 6549–6553.   
Added by: Florent Boucher 2016-05-12 13:21:37 Pop. 0.5%
wikindx 4.2.2 ©2014 | Références totales : 2699 | Requêtes métadonnées : 61 | Exécution de script : 0.09789 secs | Style : Harvard | Bibliographie : Bibliographie WIKINDX globale