| Begou, T., Beche, B., Goullet, A., Landesman, J. P., Granier, A., Cardinaud, C., Gaviot, E., Camberlein, L., Grossard, N., Jezequel, G. & Zyss, J. (2007) First developments for photonics integrated on plasma-polymer-HMDSO: Single-mode TE00-TM00 straight waveguides. Opt. Mater. 30 657–661. |
|
| Added by: Laurent Cournède 2016-03-10 22:02:29 |
Pop. 1.75%
|
| Begou, T., Becheb, B., Goullet, A., Granier, A., Cardinaud, C., Gaviot, E., Raballand, V., Landesman, J. P. & Zyss, J. (2006) Photonics integrated circuits on plasma-polymer-HMDSO: Single-mode TE(00)-TM(00) straight waveguides, S-bends, Y-junctions and mach-zehnder interferometers. Iecon 2006 - 32nd Annual Conference on Ieee Industrial Electronics, Vols 1-11 New York. |
|
| Added by: Florent Boucher 2016-05-12 13:21:38 |
Pop. 1.25%
|
| Bousquet, A., Cartry, G. & Granier, A. (2007) Investigation of O-atom kinetics in O-2, CO2, H2O and O-2/HMDSO low pressure radiofrequency pulsed plasmas by time-resolved optical emission spectroscopy. Plasma Sources Sci. Technol. 16 597–605. |
|
| Added by: Laurent Cournède 2016-03-10 22:02:29 |
Pop. 1.75%
|
| Eon, D., Raballand, V., Cartry, G. & Cardinaud, C. (2007) High density fluorocarbon plasma etching of methylsilsesquioxane SiOC(H) low-k material and SiC(H) etch stop layer: surface analyses and investigation of etch mechanisms. J. Phys. D-Appl. Phys. 40 3951–3959. |
|
| Added by: Laurent Cournède 2016-03-10 22:02:29 |
Pop. 0.75%
|
| Guyomard-Lack, A., Delannoy, P. .-E., Dupre, N., Cerclier, C. V., Humbert, B. & Le Bideau, J. (2014) Destructuring ionic liquids in ionogels: Enhanced fragility for solid devices. Phys. Chem. Chem. Phys. 16 23639–23645. |
|
| Added by: Florent Boucher 2016-04-29 09:26:45 |
Pop. 1%
|
| Ivanov, V. G., Aguilar Reyes, B., Fritsch, E. & Faulques, E. (2011) Vibrational States in Opals Revisited. J. Phys. Chem. C, 115 11968–11975. |
|
| Added by: Laurent Cournède 2016-03-10 21:32:20 |
Pop. 1%
|
| Lallement, L., Rhallabi, A., Cardinaud, C. & Fernandez, M. C. P. (2011) Modelling of fluorine based high density plasma for the etching of silica glasses. J. Vac. Sci. Technol. A, 29 051304. |
|
| Added by: Laurent Cournède 2016-03-10 21:32:20 |
Pop. 1%
|
| Lallement, L., Gosse, C., Cardinaud, C., Peignon-Fernandez, M. .-C. & Rhallabi, A. (2010) Etching studies of silica glasses in SF6/Ar inductively coupled plasmas: Implications for microfluidic devices fabrication. J. Vac. Sci. Technol. A, 28 277–286. |
|
| Added by: Laurent Cournède 2016-03-10 21:37:33 |
Pop. 1%
|
| Li, D., Carette, M., Granier, A., Landesman, J. P. & Goullet, A. (2013) In situ spectroscopic ellipsometry study of TiO2 films deposited by plasma enhanced chemical vapour deposition. Appl. Surf. Sci. 283 234–239. |
|
| Added by: Laurent Cournède 2016-03-10 21:23:29 |
Pop. 1%
|
| Mitronika, M., Granier, A., Goullet, A. & Richard-Plouet, M. (2021) Hybrid approaches coupling sol-gel and plasma for the deposition of oxide-based nanocomposite thin films: a review. SN Appl. Sci. 3 665. |
|
| Last edited by: Richard Baschera 2022-08-18 08:59:42 |
Pop. 1.75%
|
| Supiot, P., Vivien, C., Granier, A., Bousquet, A., Mackova, A., Escaich, D., Clergereaux, R., Raynaud, P., Stryhal, Z. & Pavlik, J. (2006) Growth and modification of organosilicon films in PECVD and remote afterglow reactors. Plasma Process. Polym. 3 100–109. |
|
| Added by: Florent Boucher 2016-05-12 13:21:37 |
Pop. 1%
|
