IMN

Biblio. IMN

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Abdallah, B., Chala, A., Jouan, P. .-Y., Besland, M. P. & Djouadi, M. A. (2007) Deposition of AlN films by reactive sputtering: Effect of radio frequency substrate bias. Thin Solid Films, 515 7105–7108.   
Added by: Laurent Cournède 2016-03-10 22:02:30 Pop. 1%
Li, D., Goullet, A., Carette, M., Granier, A. & Landesman, J. P. (2016) Effect of growth interruptions on TiO2 films deposited by plasma enhanced chemical vapour deposition. Mater. Chem. Phys. 182 409–417.   
Last edited by: Richard Baschera 2016-10-18 09:43:35 Pop. 0.75%
Li, D., Dai, S., Goullet, A. & Granier, A. (2018) The Effect of Plasma Gas Composition on the Nanostructures and Optical Properties of TiO2 Films Prepared by Helicon-PECVD. Nano, 13 1850124.   
Last edited by: Richard Baschera 2018-12-20 08:33:31 Pop. 0.75%
Li, D., Elisabeth, S., Granier, A., Carette, M., Goullet, A. & Landesman, J.-P. (2016) Structural and Optical Properties of PECVD TiO2-SiO2 Mixed Oxide Films for Optical Applications. Plasma Process. Polym. 13 918–928.   
Last edited by: Richard Baschera 2016-12-14 15:59:44 Pop. 0.75%
Li, D., Goullet, A., Carette, M., Granier, A., Zhang, Y. & Landesman, J. P. (2016) Structural and optical properties of RF-biased PECVD TiO2 thin films deposited in an O-2/TTIP helicon reactor. Vacuum, 131 231–239.   
Last edited by: Richard Baschera 2016-10-07 09:06:54 Pop. 0.5%
wikindx 4.2.2 ©2014 | Références totales : 2592 | Requêtes métadonnées : 49 | Exécution de script : 0.08999 secs | Style : Harvard | Bibliographie : Bibliographie WIKINDX globale