IMN

Biblio. IMN

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Belmahi, M., Bulou, S., Thouvenin, A., de Poucques, L., Hugon, R., Le Brizoual, L., Miska, P., Geneve, D., Vasseur, J.-L. & Bougdira, J. (2014) Microwave Plasma Process for SiCN:H Thin Films Synthesis with Composition Varying from SiC:H to SiN:H in H-2/N-2/Ar/Hexamethyldisilazane Gas Mixture. Plasma Process. Polym. 11 551–558.   
Added by: Laurent Cournède 2016-03-10 21:01:56 Pop. 0.75%
Bulou, S., Le Brizoual, L., Miska, P., de Poucques, L., Hugon, R., Belmahi, M. & Bougdira, J. (2011) The influence of CH4 addition on composition, structure and optical characteristics of SiCN thin films deposited in a CH4/N-2/Ar/hexamethyldisilazane microwave plasma. Thin Solid Films, 520 245–250.   
Added by: Laurent Cournède 2016-03-10 21:32:19 Pop. 0.5%
Bulou, S., Le Brizoual, L., Miska, P., de Poucques, L., Hugon, R., Belmahi, M. & Bougdira, J. (2011) Structural and optical properties of a-SiCN thin film synthesised in a microwave plasma at constant temperature and different flow of CH4 added to HMDSN/N-2/Ar mixture. Surf. Coat. Technol. 205 S214–S217.   
Added by: Laurent Cournède 2016-03-10 21:32:20 Pop. 0.5%
Bulou, S., Le Brizoual, L., Miska, P., de Poucques, L., Bougdira, J. & Belmahi, M. (2012) Wide variations of SiCxNy:H thin films optical constants deposited by H-2/N-2/Ar/hexamethyldisilazane microwave plasma. Surf. Coat. Technol. 208 46–50.   
Added by: Laurent Cournède 2016-03-10 21:28:38 Pop. 0.5%
Plujat, B., Glenat, H., Bousquet, A., Frezet, L., Hamon, J., Goullet, A., Tomasella, E., Hernandez, E., Quoizola, S. & Thomas, L. (2020) SiCN:H thin films deposited by MW-PECVD with liquid organosilicon precursor: Gas ratio influence versus properties of the deposits. Plasma Process. Polym. 17 e1900138.   
Last edited by: Richard Baschera 2020-04-24 08:36:50 Pop. 1.5%
wikindx 4.2.2 ©2014 | Références totales : 2592 | Requêtes métadonnées : 47 | Exécution de script : 0.09018 secs | Style : Harvard | Bibliographie : Bibliographie WIKINDX globale