IMN

Biblio. IMN

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Achour, A., El Mel, A. A., Bouts, N., Gautron, E., Grigore, E., Angleraud, B., Le Brizoual, L., Tessier, P. Y. & Djouadi, M. A. (2013) Carbon nanotube growth at 420 degrees C using nickel/carbon composite thin films as catalyst supports. Diam. Relat. Mat. 34 76–83.   
Added by: Laurent Cournède 2016-03-10 21:23:31 Pop. 1%
Begou, T., Beche, B., Landesman, J. P., Gaviot, E., Soussou, A., Makaoui, K., Besland, M. P., Granier, A. & Goullet, A. (2008) Integrated optics based on plasma processed dielectric materials. Kruschwitz, J. D. T. & Ellison, M. J. (Eds.), Advances in Thin-Film Coatings for Optical Applications V Bellingham.   
Added by: Laurent Cournède 2016-03-10 21:58:42 Pop. 1%
Bouchet-Fabre, B., Fernandez, V., Gohier, A., Parent, P., Laffon, C., Angleraud, B., Tessier, P. Y. & Minea, T. M. (2009) Temperature effect on the nitrogen insertion in carbon nitride films deposited by ECR. Diam. Relat. Mat. 18 1091–1097.   
Added by: Laurent Cournède 2016-03-10 21:41:23 Pop. 1.25%
Bousquet, A., Granier, A., Goullet, A. & Landesman, J. P. (2006) Influence of plasma pulsing on the deposition kinetics and film structure in low pressure oxygen/hexamethyldisiloxane radiofrequency plasmas. Thin Solid Films, 514 45–51.   
Added by: Florent Boucher 2016-05-12 13:21:36 Pop. 0.5%
Bousquet, A., Granier, A., Cartry, G. & Goullet, A. (2008) Kinetics of O and H atoms in pulsed O(2)/HMDSO low pressure PECVD plasmas. J. Optoelectron. Adv. Mater. 10 1999–2002.   
Added by: Laurent Cournède 2016-03-10 21:58:41 Pop. 0.75%
Bulou, S., Le Brizoual, L., Miska, P., de Poucques, L., Hugon, R., Belmahi, M. & Bougdira, J. (2011) The influence of CH4 addition on composition, structure and optical characteristics of SiCN thin films deposited in a CH4/N-2/Ar/hexamethyldisilazane microwave plasma. Thin Solid Films, 520 245–250.   
Added by: Laurent Cournède 2016-03-10 21:32:19 Pop. 0.5%
El Mel, A. A., Angleraud, B., Gautron, E., Granier, A. & Tessier, P. Y. (2010) Microstructure and composition of TiC/a-C:H nanocomposite thin films deposited by a hybrid IPVD/PECVD process. Surf. Coat. Technol. 204 1880–1883.   
Added by: Laurent Cournède 2016-03-10 21:37:33 Pop. 1%
Gohier, A., Minea, T. M., Point, S., Mevellec, J. .-Y., Jimenez, J., Djouadi, M. A. & Granier, A. (2009) Early stages of the carbon nanotube growth by low pressure CVD and PE-CVD. Diam. Relat. Mat. 18 61–65.   
Added by: Laurent Cournède 2016-03-10 21:41:25 Pop. 0.5%
Gohier, A., Minea, T. M., Djouadi, M. A., Jimenez, J. & Granier, A. (2007) Growth kinetics of low temperature single-wall and few walled carbon nanotubes grown by plasma enhanced chemical vapor deposition. Physica E, 37 34–39.   
Added by: Laurent Cournède 2016-03-10 22:02:30 Pop. 0.5%
Gohier, A., Djouadi, M. A., Dubosc, M., Granier, A., Minea, T. M., Sirghi, L., Rossi, F., Paredez, P. & Alvarez, F. (2007) Single- and few-walled carbon nanotubes grown at temperatures as low as 450 degrees C: Electrical and field emission characterization. J. Nanosci. Nanotechnol. 7 3350–3353.   
Added by: Laurent Cournède 2016-03-10 22:02:29 Pop. 0.75%
Granier, A., Begou, T., Makaoui, K., Soussou, A., Beche, B., Gaviot, E., Besland, M.-P. & Goullet, A. (2009) Influence of Ion Bombardment and Annealing on the Structural and Optical Properties of TiOx Thin Films Deposited in Inductively Coupled TTIP/O-2 Plasma. Plasma Process. Polym. 6 S741–S745.   
Added by: Laurent Cournède 2016-03-10 21:41:25 Pop. 0.5%
Granier, A., Borvon, G., Bousquet, A., Goullet, A., Leteinturier, C. & van der Lee, A. (2006) Mechanisms involved in the conversion of ppHMDSO films into SiO2-like by oxygen plasma treatment. Plasma Process. Polym. 3 365–373.   
Added by: Florent Boucher 2016-05-12 13:21:36 Pop. 0.75%
Li, D., Carette, M., Granier, A., Landesman, J. P. & Goullet, A. (2012) Spectroscopic ellipsometry analysis of TiO2 films deposited by plasma enhanced chemical vapor deposition in oxygen/titanium tetraisopropoxide plasma. Thin Solid Films, 522 366–371.   
Added by: Laurent Cournède 2016-03-10 21:28:38 Pop. 0.75%
Mitronika, M., Villeneuve-Faure, C., Massol, F., Boudou, L., Ravisy, W., Besland, M. P., Goullet, A. & Richard-Plouet, M. (2021) TiO2-SiO2 mixed oxide deposited by low pressure PECVD: Insights on optical and nanoscale electrical properties. Applied Surface Science, 541 148510.   
Last edited by: Richard Baschera 2021-02-12 09:48:29 Pop. 2%
Molamohammadi, M., Arman, A., Achour, A., Astinchap, B., Ahmadpourian, A., Boochani, A., Naderi, S. & Ahmadpourian, A. (2015) Microstructure and optical properties of cobalt-carbon nanocomposites prepared by RF-sputtering. J. Mater. Sci.-Mater. Electron. 26 5964–5969.   
Added by: Laurent Cournède 2016-03-10 18:36:41 Pop. 0.75%
Supiot, P., Vivien, C., Granier, A., Bousquet, A., Mackova, A., Escaich, D., Clergereaux, R., Raynaud, P., Stryhal, Z. & Pavlik, J. (2006) Growth and modification of organosilicon films in PECVD and remote afterglow reactors. Plasma Process. Polym. 3 100–109.   
Added by: Florent Boucher 2016-05-12 13:21:37 Pop. 0.75%
Tessier, P. Y., Issaoui, R., Luais, E., Boujtita, M., Granier, A. & Angleraud, B. (2009) Ionized Physical Vapour Deposition combined with PECVD, for synthesis of carbon-metal nanocomposite thin films. Solid State Sci. 11 1824–1827.   
Added by: Laurent Cournède 2016-03-10 21:41:23 Pop. 1%
wikindx 4.2.2 ©2014 | Références totales : 2683 | Requêtes métadonnées : 96 | Exécution de script : 0.1109 secs | Style : Harvard | Bibliographie : Bibliographie WIKINDX globale