IMN

Biblio. IMN

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Mot-clé:  spectroscopic ellipsometry
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Begou, T., Beche, B., Landesman, J. P., Gaviot, E., Soussou, A., Makaoui, K., Besland, M. P., Granier, A. & Goullet, A. (2008) Integrated optics based on plasma processed dielectric materials. Kruschwitz, J. D. T. & Ellison, M. J. (Eds.), Advances in Thin-Film Coatings for Optical Applications V Bellingham.   
Added by: Laurent Cournède 2016-03-10 21:58:42 Pop. 1%
Edon, V., Li, Z., Hugon, M. .-C., Krug, C., Bastos, K. P., Miotti, L., Baumvol, I. J. R., Cardinaud, C., Durand, O. & Eypert, C. (2008) Electrical properties and interfacial characteristics of RuO2/HfAlOx/SiON/Si and RuO2/LaAlO3/SiON/Si capacitors. J. Electrochem. Soc. 155 H661–H668.   
Added by: Laurent Cournède 2016-03-10 21:58:43 Pop. 1%
Li, D., Goullet, A., Carette, M., Granier, A. & Landesman, J. P. (2016) Effect of growth interruptions on TiO2 films deposited by plasma enhanced chemical vapour deposition. Mater. Chem. Phys. 182 409–417.   
Last edited by: Richard Baschera 2016-10-18 09:43:35 Pop. 0.75%
Li, D., Carette, M., Granier, A., Landesman, J. P. & Goullet, A. (2015) Effect of ion bombardment on the structural and optical properties of TiO2 thin films deposited from oxygen/titanium tetraisopropoxide inductively coupled plasma. Thin Solid Films, 589 783–791.   
Added by: Laurent Cournède 2016-03-10 18:36:41 Pop. 0.75%
Li, D., Carette, M., Granier, A., Landesman, J. P. & Goullet, A. (2013) In situ spectroscopic ellipsometry study of TiO2 films deposited by plasma enhanced chemical vapour deposition. Appl. Surf. Sci. 283 234–239.   
Added by: Laurent Cournède 2016-03-10 21:23:29 Pop. 0.5%
Li, D., Carette, M., Granier, A., Landesman, J. P. & Goullet, A. (2012) Spectroscopic ellipsometry analysis of TiO2 films deposited by plasma enhanced chemical vapor deposition in oxygen/titanium tetraisopropoxide plasma. Thin Solid Films, 522 366–371.   
Added by: Laurent Cournède 2016-03-10 21:28:38 Pop. 0.5%
Li, D., Elisabeth, S., Granier, A., Carette, M., Goullet, A. & Landesman, J.-P. (2016) Structural and Optical Properties of PECVD TiO2-SiO2 Mixed Oxide Films for Optical Applications. Plasma Process. Polym. 13 918–928.   
Last edited by: Richard Baschera 2016-12-14 15:59:44 Pop. 1%
Li, D., Goullet, A., Carette, M., Granier, A., Zhang, Y. & Landesman, J. P. (2016) Structural and optical properties of RF-biased PECVD TiO2 thin films deposited in an O-2/TTIP helicon reactor. Vacuum, 131 231–239.   
Last edited by: Richard Baschera 2016-10-07 09:06:54 Pop. 0.5%
wikindx 4.2.2 ©2014 | Références totales : 2608 | Requêtes métadonnées : 59 | Exécution de script : 0.09613 secs | Style : Harvard | Bibliographie : Bibliographie WIKINDX globale