IMN

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Begou, T., Becheb, B., Goullet, A., Granier, A., Cardinaud, C., Gaviot, E., Raballand, V., Landesman, J. P. & Zyss, J. (2006) Photonics integrated circuits on plasma-polymer-HMDSO: Single-mode TE(00)-TM(00) straight waveguides, S-bends, Y-junctions and mach-zehnder interferometers. Iecon 2006 - 32nd Annual Conference on Ieee Industrial Electronics, Vols 1-11 New York.   
Added by: Florent Boucher 2016-05-12 13:21:38 Pop. 0.75%
Eon, D., Raballand, V., Cartry, G. & Cardinaud, C. (2007) High density fluorocarbon plasma etching of methylsilsesquioxane SiOC(H) low-k material and SiC(H) etch stop layer: surface analyses and investigation of etch mechanisms. J. Phys. D-Appl. Phys. 40 3951–3959.   
Added by: Laurent Cournède 2016-03-10 22:02:29 Pop. 0.5%
Eon, D., Raballand, V., Cartry, G., Cardinaud, C., Vourdas, N., Argitis, P. & Gogolides, E. (2006) Plasma oxidation of polyhedral oligomeric silsesquioxane polymers. J. Vac. Sci. Technol. B, 24 2678–2688.   
Added by: Florent Boucher 2016-05-12 13:21:36 Pop. 0.5%
Raballand, V., Cartry, G. & Cardinaud, C. (2007) A model for Si, SiCH, SiO2, SiOCH, and porous SiOCH etch rate calculation in inductively coupled fluorocarbon plasma with a pulsed bias: Importance of the fluorocarbon layer. J. Appl. Phys. 102 063306.   
Added by: Laurent Cournède 2016-03-10 22:02:29 Pop. 0.5%
wikindx 4.2.2 ©2014 | Références totales : 2620 | Requêtes métadonnées : 45 | Exécution de script : 0.20642 secs | Style : Harvard | Bibliographie : Bibliographie WIKINDX globale