Bousquet, A., Granier, A., Cartry, G. & Goullet, A. (2008) Kinetics of O and H atoms in pulsed O(2)/HMDSO low pressure PECVD plasmas. J. Optoelectron. Adv. Mater. 10 1999–2002. |
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Added by: Laurent Cournède 2016-03-10 21:58:41 |
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Bousquet, A., Cartry, G. & Granier, A. (2007) Investigation of O-atom kinetics in O-2, CO2, H2O and O-2/HMDSO low pressure radiofrequency pulsed plasmas by time-resolved optical emission spectroscopy. Plasma Sources Sci. Technol. 16 597–605. |
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Eon, D., Raballand, V., Cartry, G. & Cardinaud, C. (2007) High density fluorocarbon plasma etching of methylsilsesquioxane SiOC(H) low-k material and SiC(H) etch stop layer: surface analyses and investigation of etch mechanisms. J. Phys. D-Appl. Phys. 40 3951–3959. |
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Added by: Laurent Cournède 2016-03-10 22:02:29 |
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Eon, D., Raballand, V., Cartry, G., Cardinaud, C., Vourdas, N., Argitis, P. & Gogolides, E. (2006) Plasma oxidation of polyhedral oligomeric silsesquioxane polymers. J. Vac. Sci. Technol. B, 24 2678–2688. |
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Added by: Florent Boucher 2016-05-12 13:21:36 |
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Gaboriau, F., Cartry, G., Peignon, M. C. & Cardinaud, C. (2006) Etching mechanisms of Si and SiO2 in fluorocarbon ICP plasmas: Analysis of the plasma by mass spectrometry, Langmuir probe and optical emission spectroscopy. J. Phys. D-Appl. Phys. 39 1830–1845. |
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Added by: Florent Boucher 2016-05-12 13:21:37 |
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Godet, L., Fang, Z., Radovanov, S., Walther, S., Arevalo, E., Lallement, F., Scheuer, J. T., Miller, T., Lenoble, D., Cartry, G. & Cardinaud, C. (2006) Plasma doping implant depth profile calculation based on ion energy distribution measurements. J. Vac. Sci. Technol. B, 24 2391–2397. |
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Added by: Florent Boucher 2016-05-12 13:21:36 |
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Raballand, V., Cartry, G. & Cardinaud, C. (2007) A model for Si, SiCH, SiO2, SiOCH, and porous SiOCH etch rate calculation in inductively coupled fluorocarbon plasma with a pulsed bias: Importance of the fluorocarbon layer. J. Appl. Phys. 102 063306. |
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Added by: Laurent Cournède 2016-03-10 22:02:29 |
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Smid, R., Granier, A., Bousquet, A., Cartry, G. & Zajickova, L. (2006) Study of magnetic field influence on charged species in a low pressure helicon reactor. Czech. J. Phys. 56 B1091–B1096. |
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Added by: Florent Boucher 2016-05-12 13:21:38 |
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