IMN

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Bachar, A., Bousquet, A., Mehdi, H., Monier, G., Robert-Goumet, C., Thomas, L., Belmahi, M., Goullet, A., Sauvage, T. & Tomasella, E. (2018) Composition and optical properties tunability of hydrogenated silicon carbonitride thin films deposited by reactive magnetron sputtering. Applied Surface Science, 444 293–302.   
Last edited by: Richard Baschera 2018-04-27 13:28:49 Pop. 0.75%
Bousquet, A., Bursikova, V., Goullet, A., Djouadi, A., Zajickova, L. & Granier, A. (2006) Comparison of structure and mechanical properties of SiO(2)-like films deposited in O(2)/HMDSO pulsed and continuous plasmas. Surf. Coat. Technol. 200 6517–6521.   
Added by: Florent Boucher 2016-05-12 13:21:37 Pop. 0.5%
Bousquet, A., Goullet, A., Leteinturier, C., Coulon, N. & Granier, A. (2008) Influence of ion bombardment on structural and electrical properties of SiO2 thin films deposited from O-2/HMDSO inductively coupled plasmas under continuous wave and pulsed modes. Eur. Phys. J.-Appl. Phys, 42 3–8.   
Added by: Laurent Cournède 2016-03-10 21:58:42 Pop. 0.5%
Bousquet, A., Granier, A., Goullet, A. & Landesman, J. P. (2006) Influence of plasma pulsing on the deposition kinetics and film structure in low pressure oxygen/hexamethyldisiloxane radiofrequency plasmas. Thin Solid Films, 514 45–51.   
Added by: Florent Boucher 2016-05-12 13:21:36 Pop. 0.75%
Bousquet, A., Cartry, G. & Granier, A. (2007) Investigation of O-atom kinetics in O-2, CO2, H2O and O-2/HMDSO low pressure radiofrequency pulsed plasmas by time-resolved optical emission spectroscopy. Plasma Sources Sci. Technol. 16 597–605.   
Added by: Laurent Cournède 2016-03-10 22:02:29 Pop. 1%
Bousquet, A., Granier, A., Cartry, G. & Goullet, A. (2008) Kinetics of O and H atoms in pulsed O(2)/HMDSO low pressure PECVD plasmas. J. Optoelectron. Adv. Mater. 10 1999–2002.   
Added by: Laurent Cournède 2016-03-10 21:58:41 Pop. 0.75%
Smid, R., Granier, A., Bousquet, A., Cartry, G. & Zajickova, L. (2006) Study of magnetic field influence on charged species in a low pressure helicon reactor. Czech. J. Phys. 56 B1091–B1096.   
Added by: Florent Boucher 2016-05-12 13:21:38 Pop. 0.5%
Supiot, P., Vivien, C., Granier, A., Bousquet, A., Mackova, A., Escaich, D., Clergereaux, R., Raynaud, P., Stryhal, Z. & Pavlik, J. (2006) Growth and modification of organosilicon films in PECVD and remote afterglow reactors. Plasma Process. Polym. 3 100–109.   
Added by: Florent Boucher 2016-05-12 13:21:37 Pop. 0.75%
wikindx 4.2.2 ©2014 | Références totales : 2685 | Requêtes métadonnées : 61 | Exécution de script : 0.21503 secs | Style : Harvard | Bibliographie : Bibliographie WIKINDX globale