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| Keraudy, J., Delfour-Peyrethon, B., Ferrec, A., Molleja, J. G., Richard-Plouet, M., Payen, C., Hamon, J., Corraze, B., Goullet, A. & Jouan, P.-Y. (2017) Process- and optoelectronic-control of NiOx thin films deposited by reactive high power impulse magnetron sputtering. Journal of Applied Physics, 121 171916. |
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| Li, D., Dai, S., Goullet, A. & Granier, A. (2019) Ion impingement effect on the structure and optical properties of TixSi1-xO2 films deposited by ICP-PECVD. Plasma Processes and Polymers, 16 1900034. |
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| Li, D., Elisabeth, S., Granier, A., Carette, M., Goullet, A. & Landesman, J.-P. (2016) Structural and Optical Properties of PECVD TiO2-SiO2 Mixed Oxide Films for Optical Applications. Plasma Process. Polym. 13 918–928. |
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| Mitronika, M., Profili, J., Goullet, A., Gautier, N., Stephant, N., Stafford, L., Granier, A. & Richard-Plouet, M. (2021) TiO2-SiO2 nanocomposite thin films deposited by direct liquid injection of colloidal solution in an O-2/HMDSO low-pressure plasma. J. Phys. D: Appl. Phys. 54 085206. |
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| Plujat, B., Glenat, H., Bousquet, A., Frezet, L., Hamon, J., Goullet, A., Tomasella, E., Hernandez, E., Quoizola, S. & Thomas, L. (2020) SiCN:H thin films deposited by MW-PECVD with liquid organosilicon precursor: Gas ratio influence versus properties of the deposits. Plasma Process. Polym. 17 e1900138. |
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| Plujat, B., Glenat, H., Hamon, J., Gazal, Y., Goullet, A., Hernandez, E., Quoizola, S. & Thomas, L. (2018) Near-field scanning microscopy and physico-chemical analysis versus time of SiCN:H thin films grown in Ar/NH3/TMS gas mixture using MW-Plasma CVD at 400 degrees C. Plasma Processes and Polymers, 15 e1800066. |
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| Salimy, S., Goullet, A., Rhallabi, A., Challali, F., Toutain, S. & Saubat, J. C. (2011) A unified analytical and scalable lumped model of RF CMOS spiral inductors based on electromagnetic effects and circuit analysis. Solid-State Electron. 61 38–45. |
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| Added by: Laurent Cournède 2016-03-10 21:32:20 |
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| Zajickova, L., Bursikova, V., Franta, D., Bousquet, A., Granier, A., Goullet, A. & Bursik, J. (2007) Comparative Study of Films Deposited from HMDSO/O(2) in Continuous Wave and Pulsed rf Discharges. Plasma Process. Polym. 4 S287–S293. |
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| Added by: Laurent Cournède 2016-03-10 22:02:30 |
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