IMN

Biblio. IMN

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Belmahi, M., Bulou, S., Thouvenin, A., de Poucques, L., Hugon, R., Le Brizoual, L., Miska, P., Geneve, D., Vasseur, J.-L. & Bougdira, J. (2014) Microwave Plasma Process for SiCN:H Thin Films Synthesis with Composition Varying from SiC:H to SiN:H in H-2/N-2/Ar/Hexamethyldisilazane Gas Mixture. Plasma Process. Polym. 11 551–558.   
Added by: Laurent Cournède 2016-03-10 21:01:56 Pop. 0.75%
Bulou, S., Le Brizoual, L., Hugon, R., De Poucques, L., Belmahi, M., Migeon, H.-N. & Bougdira, J. (2009) Characterization of a N-2/CH4 Microwave Plasma With a Solid Additive Si Source Used for SiCN Deposition. Plasma Process. Polym. 6 S576–S581.   
Added by: Laurent Cournède 2016-03-10 21:41:25 Pop. 0.5%
Bulou, S., Le Brizoual, L., Miska, P., de Poucques, L., Hugon, R., Belmahi, M. & Bougdira, J. (2011) The influence of CH4 addition on composition, structure and optical characteristics of SiCN thin films deposited in a CH4/N-2/Ar/hexamethyldisilazane microwave plasma. Thin Solid Films, 520 245–250.   
Added by: Laurent Cournède 2016-03-10 21:32:19 Pop. 0.5%
Bulou, S., Le Brizoual, L., Miska, P., de Poucques, L., Bougdira, J. & Belmahi, M. (2012) Wide variations of SiCxNy:H thin films optical constants deposited by H-2/N-2/Ar/hexamethyldisilazane microwave plasma. Surf. Coat. Technol. 208 46–50.   
Added by: Laurent Cournède 2016-03-10 21:28:38 Pop. 0.5%
Dey, B., Bulou, S., Ravisy, W., Gautier, N., Richard-Plouet, M., Granier, A. & Choquet, P. (2022) Low-temperature deposition of self-cleaning anatase TiO2 coatings on polymer glazing via sequential continuous and pulsed PECVD. Surface and Coatings Technology, 436 128256.   
Last edited by: Richard Baschera 2022-04-29 14:20:33 Pop. 6.5%
wikindx 4.2.2 ©2014 | Références totales : 2592 | Requêtes métadonnées : 48 | Exécution de script : 0.20642 secs | Style : Harvard | Bibliographie : Bibliographie WIKINDX globale