| Antoun, G., Tillocher, T., Girard, A., Lefaucheux, P., Faguet, J., Kim, H., Zhang, D., Wang, M., Maekawa, K., Cardinaud, C. & Dussart, R. (2022) Cryogenic nanoscale etching of silicon nitride selectively to silicon by alternating SiF4/O-2 and Ar plasmas. Journal of Vacuum Science & Technology A, 40. |
|
| Last edited by: Richard Baschera 2022-10-17 15:19:39 |
Pop. 2.75%
|
| Antoun, G., Girard, A., Tillocher, T., Lefaucheux, P., Faguet, J., Maekawa, K., Cardinaud, C. & Dussart, R. (2022) Quasi In Situ XPS on a SiOxFy Layer Deposited on Silicon by a Cryogenic Process. ECS J. Solid State Sci. Technol. 11 013013. |
|
| Last edited by: Richard Baschera 2022-02-10 17:00:11 |
Pop. 2.5%
|
| Antoun, G., Dussart, R., Tillocher, T., Lefaucheux, P., Cardinaud, C., Girard, A., Tahara, S., Yamazaki, K., Yatsuda, K., Faguet, J. & Maekawa, K. (2019) The role of physisorption in the cryogenic etching process of silicon. Japanese Journal of Applied Physics, 58 SEEB03. |
|
| Last edited by: Richard Baschera 2019-07-25 07:42:14 |
Pop. 1%
|
| Baudet, E., Cardinaud, C., Girard, A., Rinnert, E., Michel, K., Bureau, B. & Nazabal, V. (2016) Structural analysis of RF sputtered Ge-Sb-Se thin films by Raman and X-ray photoelectron spectroscopies. Journal of Non-Crystalline Solids, 444 64–72. |
|
| Last edited by: administrateur 2016-08-25 14:00:55 |
Pop. 0.75%
|
| Girard, A., Coulon, N., Cardinaud, C., Mohammed-Brahim, T. & Geneste, F. (2014) Effect of doping on the modification of polycrystalline silicon by spontaneous reduction of diazonium salts. Appl. Surf. Sci. 314 358–366. |
|
| Added by: Laurent Cournède 2016-03-10 21:01:55 |
Pop. 1.25%
|
| Girard, A., Geneste, F., Coulon, N., Cardinaud, C. & Mohammed-Brahim, T. (2013) SiGe derivatization by spontaneous reduction of aryl diazonium salts. Appl. Surf. Sci. 282 146–155. |
|
| Added by: Laurent Cournède 2016-03-10 21:23:30 |
Pop. 0.5%
|
| Meyer, T., LeDain, G., Girard, A., Rhallabi, A., Bouška, M., Nemec, P., Nazabal, V. & Cardinaud, C. (2020) Etching of GeSe2 chalcogenide glass and its pulsed laser deposited thin films in SF6, SF6/Ar and SF6/O-2 plasmas. Plasma Sources Sci. Technol. 29 105006. |
|
| Last edited by: Richard Baschera 2020-11-17 14:03:42 |
Pop. 1%
|
| Meyer, T., Girard, A., LeDain, G., Rhallabi, A., Baudet, E., Nazabal, V., Nemec, P. & Cardinaud, C. (2021) Surface composition and micromasking effect during the etching of amorphous Ge-Sb-Se thin films in SF6 and SF6 /Ar plasmas. Applied Surface Science, 549 149192. |
|
| Last edited by: Richard Baschera 2021-04-09 11:41:07 |
Pop. 1.5%
|
