IMN

Biblio. IMN

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Dey, B., Bulou, S., Ravisy, W., Gautier, N., Richard-Plouet, M., Granier, A. & Choquet, P. (2022) Low-temperature deposition of self-cleaning anatase TiO2 coatings on polymer glazing via sequential continuous and pulsed PECVD. Surface and Coatings Technology, 436 128256.   
Last edited by: Richard Baschera 2022-04-29 14:20:33 Pop. 2%
El Mel, A.-A., Stephant, N., Hamon, J., Thiry, D., Chauvin, A., Chettab, M., Gautron, E., Konstantinidis, S., Granier, A. & Tessier, P.-Y. (2016) Creating nanoporosity in silver nanocolumns by direct exposure to radio-frequency air plasma. Nanoscale, 8 141–148.   
Added by: Laurent Cournède 2016-03-10 20:44:50 Pop. 1%
El Mel, A.-A., Duvail, J.-L., Gautron, E., Xu, W., Choi, C.-H., Angleraud, B., Granier, A. & Tessier, P.-Y. (2012) Highly ordered ultralong magnetic nanowires wrapped in stacked graphene layers. Beilstein J. Nanotechnol. 3 846–851.   
Added by: Laurent Cournède 2016-03-10 21:28:37 Pop. 1%
Granier, A., Borvon, G., Bousquet, A., Goullet, A., Leteinturier, C. & van der Lee, A. (2006) Mechanisms involved in the conversion of ppHMDSO films into SiO2-like by oxygen plasma treatment. Plasma Process. Polym. 3 365–373.   
Added by: Florent Boucher 2016-05-12 13:21:36 Pop. 1%
Granier, A., Begou, T., Makaoui, K., Soussou, A., Beche, B., Gaviot, E., Besland, M.-P. & Goullet, A. (2009) Influence of Ion Bombardment and Annealing on the Structural and Optical Properties of TiOx Thin Films Deposited in Inductively Coupled TTIP/O-2 Plasma. Plasma Process. Polym. 6 S741–S745.   
Added by: Laurent Cournède 2016-03-10 21:41:25 Pop. 0.75%
Li, D., Dai, S., Goullet, A. & Granier, A. (2019) Ion impingement effect on the structure and optical properties of TixSi1-xO2 films deposited by ICP-PECVD. Plasma Processes and Polymers, 16 1900034.   
Last edited by: Richard Baschera 2019-08-23 13:39:11 Pop. 1.25%
Li, D., Elisabeth, S., Granier, A., Carette, M., Goullet, A. & Landesman, J.-P. (2016) Structural and Optical Properties of PECVD TiO2-SiO2 Mixed Oxide Films for Optical Applications. Plasma Process. Polym. 13 918–928.   
Last edited by: Richard Baschera 2016-12-14 15:59:44 Pop. 1.5%
Mitronika, M., Profili, J., Goullet, A., Gautier, N., Stephant, N., Stafford, L., Granier, A. & Richard-Plouet, M. (2021) TiO2-SiO2 nanocomposite thin films deposited by direct liquid injection of colloidal solution in an O-2/HMDSO low-pressure plasma. J. Phys. D: Appl. Phys. 54 085206.   
Last edited by: Richard Baschera 2021-01-11 08:47:24 Pop. 2%
Mitronika, M., Granier, A., Goullet, A. & Richard-Plouet, M. (2021) Hybrid approaches coupling sol-gel and plasma for the deposition of oxide-based nanocomposite thin films: a review. SN Appl. Sci. 3 665.   
Last edited by: Richard Baschera 2022-08-18 08:59:42 Pop. 1.75%
Ondracka, P., Necas, D., Carette, M., Elisabeth, S., Holec, D., Granier, A., Goullet, A., Zajickova, L. & Richard-Plouet, M. (2020) Unravelling local environments in mixed TiO2-SiO2 thin films by XPS and ab initio calculations. Appl. Surf. Sci. 510 145056.   
Last edited by: Richard Baschera 2020-03-13 14:52:57 Pop. 1.25%
Thiry, D., Chauvin, A., El Mel, A.-A., Cardinaud, C., Hamon, J., Gautron, E., Stephant, N., Granier, A. & Tessier, P.-Y. (2017) Tailoring the chemistry and the nano-architecture of organic thin films using cold plasma processes. Plasma Processes and Polymers, 14 e1700042.   
Last edited by: Richard Baschera 2017-12-05 15:48:56 Pop. 1.25%
Vallee, C., Bonvalot, M., Belahcen, S., Yeghoyan, T., Jaffal, M., Vallat, R., Chaker, A., Lefèvre, G., David, S., Bsiesy, A., Posseme, N., Gassilloud, R. & Granier, A. (2020) Plasma deposition-Impact of ions in plasma enhanced chemical vapor deposition, plasma enhanced atomic layer deposition, and applications to area selective deposition. Journal of Vacuum Science & Technology A, 38 033007.   
Last edited by: Richard Baschera 2020-05-15 08:31:27 Pop. 1.5%
Zajickova, L., Bursikova, V., Franta, D., Bousquet, A., Granier, A., Goullet, A. & Bursik, J. (2007) Comparative Study of Films Deposited from HMDSO/O(2) in Continuous Wave and Pulsed rf Discharges. Plasma Process. Polym. 4 S287–S293.   
Added by: Laurent Cournède 2016-03-10 22:02:30 Pop. 0.75%
wikindx 4.2.2 ©2014 | Références totales : 2830 | Requêtes métadonnées : 78 | Exécution de script : 0.49113 secs | Style : Harvard | Bibliographie : Bibliographie WIKINDX globale