| Avella, M., Jimenez, J., Pommereau, F., Landesman, J. P. & Rhallabi, A. (2007) Investigation of point defect generation in dry etched InP ridge waveguide structures. Appl. Phys. Lett. 90 223510. |
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| Added by: Laurent Cournède 2016-03-10 22:02:30 |
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| Avella, M., Jimenez, J., Pommereau, F., Landesman, J. P. & Rhallabi, A. (2008) Process induced mechanical stress in InP ridge waveguides fabricated by inductively coupled plasma etching. Appl. Phys. Lett. 93 131913. |
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| Added by: Laurent Cournède 2016-03-10 21:58:41 |
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| Chanson, R., Rhallabi, A., Fernandez, M. C., Cardinaud, C., Bouchoule, S., Gatilova, L. & Talneau, A. (2012) Global Model of Cl-2/Ar High-Density Plasma Discharge and 2-D Monte-Carlo Etching Model of InP. IEEE Trans. Plasma Sci. 40 959–971. |
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| Added by: Laurent Cournède 2016-03-10 21:28:39 |
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| Chanson, R., Martin, A., Avella, M., Jimenez, J., Pommereau, F., Landesman, J. P. & Rhallabi, A. (2010) Cathodoluminescence Study of InP Photonic Structures Fabricated by Dry Etching. J. Electron. Mater. 39 688–693. |
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| Added by: Laurent Cournède 2016-03-10 21:37:32 |
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| Elmonser, L., Rhallabi, A., Gaillard, M., Landesman, J. P., Talneau, A., Pommereau, F. & Bouadma, N. (2007) Modeling of the chemically assisted ion beam etching process: Application to the GaAs etching by Cl-2/Ar+. J. Vac. Sci. Technol. A, 25 126–133. |
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| Added by: Laurent Cournède 2016-03-10 22:02:31 |
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| Lallement, L., Gosse, C., Cardinaud, C., Peignon-Fernandez, M. .-C. & Rhallabi, A. (2010) Etching studies of silica glasses in SF6/Ar inductively coupled plasmas: Implications for microfluidic devices fabrication. J. Vac. Sci. Technol. A, 28 277–286. |
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| Added by: Laurent Cournède 2016-03-10 21:37:33 |
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| Landesman, J. P., Levallois, C., Jimenez, J., Pommereau, F., Leger, Y., Beck, A., Delhaye, T., Torres, A., Frigeri, C. & Rhallabi, A. (2015) Evidence of chlorine ion penetration in InP/InAsP quantum well structures during dry etching processes and effects of induced-defects on the electronic and structural behaviour. Microelectron. Reliab. 55 1750–1753. |
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| Added by: Laurent Cournède 2016-03-10 18:36:41 |
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| Liu, B., Landesman, J. .-P., Leclercq, J. .-L., Rhallabi, A., Cardinaud, C., Guilet, S., Pommereau, F., Avella, M., Gonzalez, M. A. & Jimenez, J. (2006) InP surface properties under ICP plasma etching using mixtures of chlorides and hydrides. Mater. Sci. Semicond. Process, 9 225–229. |
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| Added by: Florent Boucher 2016-05-12 13:21:38 |
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| Liu, B., Landesman, J. .-P., Leclercq, J. .-L., Rhallabi, A., Avella, M., Gonzalez, M. A., Jimenez, J., Guilet, S., Cardinaud, C. & Pommereau, F. (2006) InP surface properties under ICP plasma etching using mixtures of chlorides and hydrides New York, Ieee. |
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| Added by: Florent Boucher 2016-05-12 13:21:38 |
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| Marcos, G., Rhallabi, A. & Ranson, P. (2008) Properties of deep etched trenches in silicon: Role of the angular dependence of the sputtering yield and the etched species redeposition. Appl. Surf. Sci. 254 3576–3584. |
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| Added by: Laurent Cournède 2016-03-10 21:58:42 |
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| Meyer, T., LeDain, G., Girard, A., Rhallabi, A., Bouška, M., Nemec, P., Nazabal, V. & Cardinaud, C. (2020) Etching of GeSe2 chalcogenide glass and its pulsed laser deposited thin films in SF6, SF6/Ar and SF6/O-2 plasmas. Plasma Sources Sci. Technol. 29 105006. |
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| Last edited by: Richard Baschera 2020-11-17 14:03:42 |
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| Meyer, T., Girard, A., LeDain, G., Rhallabi, A., Baudet, E., Nazabal, V., Nemec, P. & Cardinaud, C. (2021) Surface composition and micromasking effect during the etching of amorphous Ge-Sb-Se thin films in SF6 and SF6 /Ar plasmas. Applied Surface Science, 549 149192. |
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| Last edited by: Richard Baschera 2021-04-09 11:41:07 |
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| Rhallabi, A., Liu, B., Landesman, J. P. & Lecler, J. L. (2006) InP etching by chlorine ICP plasma for photonic crystal applications: Experiments and simulations New York, Ieee. |
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| Added by: Florent Boucher 2016-05-12 13:21:38 |
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| Rhallabi, A., Chanson, R., Landesman, J. .-P., Cardinaud, C. & Fernandez, M. .-C. (2011) Atomic scale study of InP etching by Cl-2-Ar ICP plasma discharge. Eur. Phys. J.-Appl. Phys, 53 33606. |
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| Added by: Laurent Cournède 2016-03-10 21:32:21 |
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| Salimy, S., Challali, F., Goullet, A., Besland, M. .-P., Carette, M., Gautier, N., Rhallabi, A., Landesman, J. P., Toutain, S. & Averty, D. (2013) Electrical Characteristics of TiTaO Thin Films Deposited on SiO2/Si Substrates by Magnetron Sputtering. ECS Solid State Lett. 2 Q13–Q15. |
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| Added by: Laurent Cournède 2016-03-10 21:23:32 |
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| Zgheib, J., Berthelot, L., Tranchant, J., Ginot, N., Besland, M. .-P., Caillard, A., Minea, T., Rhallabi, A. & Jouan, P. .-Y. (2023) Electron-enhanced high power impulse magnetron sputtering with a multilevel high power supply: Application to Ar/Cr plasma discharge. Journal of Vacuum Science & Technology A, 41 063003. |
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| Last edited by: Richard Baschera 2023-11-22 08:53:13 |
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