IMN

Biblio. IMN

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Avella, M., Jimenez, J., Pommereau, F., Landesman, J. P. & Rhallabi, A. (2007) Investigation of point defect generation in dry etched InP ridge waveguide structures. Appl. Phys. Lett. 90 223510.   
Added by: Laurent Cournède 2016-03-10 22:02:30 Pop. 0.5%
Avella, M., Jimenez, J., Pommereau, F., Landesman, J. P. & Rhallabi, A. (2008) Process induced mechanical stress in InP ridge waveguides fabricated by inductively coupled plasma etching. Appl. Phys. Lett. 93 131913.   
Added by: Laurent Cournède 2016-03-10 21:58:41 Pop. 1%
Chanson, R., Martin, A., Avella, M., Jimenez, J., Pommereau, F., Landesman, J. P. & Rhallabi, A. (2010) Cathodoluminescence Study of InP Photonic Structures Fabricated by Dry Etching. J. Electron. Mater. 39 688–693.   
Added by: Laurent Cournède 2016-03-10 21:37:32 Pop. 1%
Chanson, R., Rhallabi, A., Fernandez, M. C., Cardinaud, C., Bouchoule, S., Gatilova, L. & Talneau, A. (2012) Global Model of Cl-2/Ar High-Density Plasma Discharge and 2-D Monte-Carlo Etching Model of InP. IEEE Trans. Plasma Sci. 40 959–971.   
Added by: Laurent Cournède 2016-03-10 21:28:39 Pop. 0.5%
Elmonser, L., Rhallabi, A., Gaillard, M., Landesman, J. P., Talneau, A., Pommereau, F. & Bouadma, N. (2007) Modeling of the chemically assisted ion beam etching process: Application to the GaAs etching by Cl-2/Ar+. J. Vac. Sci. Technol. A, 25 126–133.   
Added by: Laurent Cournède 2016-03-10 22:02:31 Pop. 0.75%
Lallement, L., Gosse, C., Cardinaud, C., Peignon-Fernandez, M. .-C. & Rhallabi, A. (2010) Etching studies of silica glasses in SF6/Ar inductively coupled plasmas: Implications for microfluidic devices fabrication. J. Vac. Sci. Technol. A, 28 277–286.   
Added by: Laurent Cournède 2016-03-10 21:37:33 Pop. 0.5%
Landesman, J. P., Levallois, C., Jimenez, J., Pommereau, F., Leger, Y., Beck, A., Delhaye, T., Torres, A., Frigeri, C. & Rhallabi, A. (2015) Evidence of chlorine ion penetration in InP/InAsP quantum well structures during dry etching processes and effects of induced-defects on the electronic and structural behaviour. Microelectron. Reliab. 55 1750–1753.   
Added by: Laurent Cournède 2016-03-10 18:36:41 Pop. 0.5%
Liu, B., Landesman, J. .-P., Leclercq, J. .-L., Rhallabi, A., Cardinaud, C., Guilet, S., Pommereau, F., Avella, M., Gonzalez, M. A. & Jimenez, J. (2006) InP surface properties under ICP plasma etching using mixtures of chlorides and hydrides. Mater. Sci. Semicond. Process, 9 225–229.   
Added by: Florent Boucher 2016-05-12 13:21:38 Pop. 0.5%
Liu, B., Landesman, J. .-P., Leclercq, J. .-L., Rhallabi, A., Avella, M., Gonzalez, M. A., Jimenez, J., Guilet, S., Cardinaud, C. & Pommereau, F. (2006) InP surface properties under ICP plasma etching using mixtures of chlorides and hydrides New York, Ieee.   
Added by: Florent Boucher 2016-05-12 13:21:38 Pop. 0.5%
Marcos, G., Rhallabi, A. & Ranson, P. (2008) Properties of deep etched trenches in silicon: Role of the angular dependence of the sputtering yield and the etched species redeposition. Appl. Surf. Sci. 254 3576–3584.   
Added by: Laurent Cournède 2016-03-10 21:58:42 Pop. 0.5%
Meyer, T., LeDain, G., Girard, A., Rhallabi, A., Bouška, M., Nemec, P., Nazabal, V. & Cardinaud, C. (2020) Etching of GeSe2 chalcogenide glass and its pulsed laser deposited thin films in SF6, SF6/Ar and SF6/O-2 plasmas. Plasma Sources Sci. Technol. 29 105006.   
Last edited by: Richard Baschera 2020-11-17 14:03:42 Pop. 0.75%
Meyer, T., Girard, A., LeDain, G., Rhallabi, A., Baudet, E., Nazabal, V., Nemec, P. & Cardinaud, C. (2021) Surface composition and micromasking effect during the etching of amorphous Ge-Sb-Se thin films in SF6 and SF6 /Ar plasmas. Applied Surface Science, 549 149192.   
Last edited by: Richard Baschera 2021-04-09 11:41:07 Pop. 1.75%
Rhallabi, A., Chanson, R., Landesman, J. .-P., Cardinaud, C. & Fernandez, M. .-C. (2011) Atomic scale study of InP etching by Cl-2-Ar ICP plasma discharge. Eur. Phys. J.-Appl. Phys, 53 33606.   
Added by: Laurent Cournède 2016-03-10 21:32:21 Pop. 0.5%
Rhallabi, A., Liu, B., Landesman, J. P. & Lecler, J. L. (2006) InP etching by chlorine ICP plasma for photonic crystal applications: Experiments and simulations New York, Ieee.   
Added by: Florent Boucher 2016-05-12 13:21:38 Pop. 0.5%
Salimy, S., Challali, F., Goullet, A., Besland, M. .-P., Carette, M., Gautier, N., Rhallabi, A., Landesman, J. P., Toutain, S. & Averty, D. (2013) Electrical Characteristics of TiTaO Thin Films Deposited on SiO2/Si Substrates by Magnetron Sputtering. ECS Solid State Lett. 2 Q13–Q15.   
Added by: Laurent Cournède 2016-03-10 21:23:32 Pop. 0.5%
wikindx 4.2.2 ©2014 | Références totales : 2608 | Requêtes métadonnées : 88 | Exécution de script : 0.22473 secs | Style : Harvard | Bibliographie : Bibliographie WIKINDX globale