IMN

Biblio. IMN

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Avella, M., Jimenez, J., Pommereau, F., Landesman, J. P. & Rhallabi, A. (2007) Investigation of point defect generation in dry etched InP ridge waveguide structures. Appl. Phys. Lett. 90 223510.   
Added by: Laurent Cournède 2016-03-10 22:02:30 Pop. 0.25%
Avella, M., Jimenez, J., Pommereau, F., Landesman, J. P. & Rhallabi, A. (2008) Process induced mechanical stress in InP ridge waveguides fabricated by inductively coupled plasma etching. Appl. Phys. Lett. 93 131913.   
Added by: Laurent Cournède 2016-03-10 21:58:41 Pop. 0.75%
Chanson, R., Martin, A., Avella, M., Jimenez, J., Pommereau, F., Landesman, J. P. & Rhallabi, A. (2010) Cathodoluminescence Study of InP Photonic Structures Fabricated by Dry Etching. J. Electron. Mater. 39 688–693.   
Added by: Laurent Cournède 2016-03-10 21:37:32 Pop. 0.75%
Gohier, A., Minea, T. M., Point, S., Mevellec, J. .-Y., Jimenez, J., Djouadi, M. A. & Granier, A. (2009) Early stages of the carbon nanotube growth by low pressure CVD and PE-CVD. Diam. Relat. Mat. 18 61–65.   
Added by: Laurent Cournède 2016-03-10 21:41:25 Pop. 0.25%
Gohier, A., Minea, T. M., Djouadi, M. A., Jimenez, J. & Granier, A. (2007) Growth kinetics of low temperature single-wall and few walled carbon nanotubes grown by plasma enhanced chemical vapor deposition. Physica E, 37 34–39.   
Added by: Laurent Cournède 2016-03-10 22:02:30 Pop. 0.25%
Landesman, J. P., Levallois, C., Jimenez, J., Pommereau, F., Leger, Y., Beck, A., Delhaye, T., Torres, A., Frigeri, C. & Rhallabi, A. (2015) Evidence of chlorine ion penetration in InP/InAsP quantum well structures during dry etching processes and effects of induced-defects on the electronic and structural behaviour. Microelectron. Reliab. 55 1750–1753.   
Added by: Laurent Cournède 2016-03-10 18:36:41 Pop. 0.5%
Liu, B., Landesman, J. .-P., Leclercq, J. .-L., Rhallabi, A., Cardinaud, C., Guilet, S., Pommereau, F., Avella, M., Gonzalez, M. A. & Jimenez, J. (2006) InP surface properties under ICP plasma etching using mixtures of chlorides and hydrides. Mater. Sci. Semicond. Process, 9 225–229.   
Added by: Florent Boucher 2016-05-12 13:21:38 Pop. 0.25%
Liu, B., Landesman, J. .-P., Leclercq, J. .-L., Rhallabi, A., Avella, M., Gonzalez, M. A., Jimenez, J., Guilet, S., Cardinaud, C. & Pommereau, F. (2006) InP surface properties under ICP plasma etching using mixtures of chlorides and hydrides New York, Ieee.   
Added by: Florent Boucher 2016-05-12 13:21:38 Pop. 0.25%
wikindx 4.2.2 ©2014 | Références totales : 2654 | Requêtes métadonnées : 59 | Exécution de script : 0.21406 secs | Style : Harvard | Bibliographie : Bibliographie WIKINDX globale