IMN

Biblio. IMN

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Achour, A., Belkerk, B. E., Aissa, A. K., Vizireanu, S., Gautron, E., Carette, M., Jouan, P. .-Y., Dinescu, G., Le Brizoual, L., Scudeller, Y. & Djouadi, M. .-A. (2013) Thermal properties of carbon nanowall layers measured by a pulsed photothermal technique. Appl. Phys. Lett. 102 061903.   
Added by: Laurent Cournède 2016-03-10 21:23:31 Pop. 0.75%
Belkerk, B. E., Soussou, M. A., Carette, M., Djouadi, M. A. & Scudeller, Y. (2012) Measuring thermal conductivity of thin films and coatings with the ultra-fast transient hot-strip technique. J. Phys. D-Appl. Phys. 45 295303.   
Added by: Laurent Cournède 2016-03-10 21:28:38 Pop. 0.5%
Belkerk, B. E., Soussou, A., Carette, M., Djouadi, M. A. & Scudeller, Y. (2012) Structural-dependent thermal conductivity of aluminium nitride produced by reactive direct current magnetron sputtering. Appl. Phys. Lett. 101 151908.   
Added by: Laurent Cournède 2016-03-10 21:28:38 Pop. 0.5%
Belkerk, B. E., Bensalem, S., Soussou, A., Carette, M., Al Brithen, H., Djouadi, M. A. & Scudeller, Y. (2014) Substrate-dependent thermal conductivity of aluminum nitride thin-films processed at low temperature. Appl. Phys. Lett. 105 221905.   
Added by: Laurent Cournède 2016-03-10 21:01:54 Pop. 0.75%
Li, D., Dai, S., Goullet, A., Carette, M., Granier, A. & Landesman, J. P. (2018) Annealing and biasing effects on the structural and optical properties of PECVD-grown TiO2 films from TTIP/O-2 plasma. Journal of Materials Science-Materials in Electronics, 29 13254–13264.   
Last edited by: Richard Baschera 2018-08-20 08:30:20 Pop. 0.75%
Li, D., Goullet, A., Carette, M., Granier, A. & Landesman, J. P. (2016) Effect of growth interruptions on TiO2 films deposited by plasma enhanced chemical vapour deposition. Mater. Chem. Phys. 182 409–417.   
Last edited by: Richard Baschera 2016-10-18 09:43:35 Pop. 0.75%
Li, D., Carette, M., Granier, A., Landesman, J. P. & Goullet, A. (2015) Effect of ion bombardment on the structural and optical properties of TiO2 thin films deposited from oxygen/titanium tetraisopropoxide inductively coupled plasma. Thin Solid Films, 589 783–791.   
Added by: Laurent Cournède 2016-03-10 18:36:41 Pop. 0.75%
Li, D., Carette, M., Granier, A., Landesman, J. P. & Goullet, A. (2013) In situ spectroscopic ellipsometry study of TiO2 films deposited by plasma enhanced chemical vapour deposition. Appl. Surf. Sci. 283 234–239.   
Added by: Laurent Cournède 2016-03-10 21:23:29 Pop. 0.5%
Li, D., Carette, M., Granier, A., Landesman, J. P. & Goullet, A. (2012) Spectroscopic ellipsometry analysis of TiO2 films deposited by plasma enhanced chemical vapor deposition in oxygen/titanium tetraisopropoxide plasma. Thin Solid Films, 522 366–371.   
Added by: Laurent Cournède 2016-03-10 21:28:38 Pop. 0.5%
Li, D., Goullet, A., Carette, M., Granier, A., Zhang, Y. & Landesman, J. P. (2016) Structural and optical properties of RF-biased PECVD TiO2 thin films deposited in an O-2/TTIP helicon reactor. Vacuum, 131 231–239.   
Last edited by: Richard Baschera 2016-10-07 09:06:54 Pop. 0.5%
Salimy, S., Challali, F., Goullet, A., Besland, M. .-P., Carette, M., Gautier, N., Rhallabi, A., Landesman, J. P., Toutain, S. & Averty, D. (2013) Electrical Characteristics of TiTaO Thin Films Deposited on SiO2/Si Substrates by Magnetron Sputtering. ECS Solid State Lett. 2 Q13–Q15.   
Added by: Laurent Cournède 2016-03-10 21:23:32 Pop. 0.5%
wikindx 4.2.2 ©2014 | Références totales : 2608 | Requêtes métadonnées : 70 | Exécution de script : 0.21571 secs | Style : Harvard | Bibliographie : Bibliographie WIKINDX globale